메뉴 건너뛰기




Volumn 28, Issue 3, 2010, Pages 419-424

Electrostatic quadrupole plasma mass spectrometer measurements during thin film depositions using simultaneous matrix assisted pulsed laser evaporation and magnetron sputtering

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; ARGON-OXYGEN MIXTURES; CARBON CONTAMINATION; CARBON DEPOSITES; CARBON DISTRIBUTION; CARBON IMPURITIES; CARBON NANOPEARLS; CO-DEPOSITED FILMS; CODEPOSITION PROCESS; COMPOSITE THIN FILMS; DEPOSITED FILMS; DEPOSITION CHAMBERS; DEPOSITION PROCESS; ELECTROSTATIC QUADRUPOLE; ELEMENTAL MAPPING; ENERGY DISPERSIVE SPECTROMETRY; HIGH-RESOLUTION TEM; HYBRID PLASMA; HYBRID PROCESS; MAGNETRON SPUTTER; MAGNETRON SPUTTERING PROCESS; MATRIX; MATRIX ASSISTED PULSED LASER EVAPORATION; NANO SCALE; PLASMA ANALYSIS; PLASMA MASS SPECTROMETERS; REACTIVE OXYGEN SPECIES; SPUTTER RATE; SPUTTER YIELDS; TEM; THIN-FILM DEPOSITIONS; TOLUENE VAPORS;

EID: 77952414580     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3372401     Document Type: Article
Times cited : (7)

References (18)
  • 3
    • 0037185135 scopus 로고    scopus 로고
    • Processing of functional polymers and organic thin films by the matrix-assisted pulsed laser evaporation (MAPLE) technique
    • DOI 10.1016/S0169-4332(01)00704-8, PII S0169433201007048
    • A. Piqú, P. Wu, B. R. Ringeisen, D. M. Bubb, J. S. Melinger, R. A. McGill, and D. B. Chrisey, Appl. Surf. Sci. ASUSEE 0169-4332 186, 408 (2002). 10.1016/S0169-4332(01)00704-8 (Pubitemid 34231962)
    • (2002) Applied Surface Science , vol.186 , Issue.1-4 , pp. 408-415
    • Pique, A.1    Wu, P.2    Ringeisen, B.R.3    Bubb, D.M.4    Melinger, J.S.5    McGill, R.A.6    Chrisey, D.B.7
  • 4
    • 19744368006 scopus 로고    scopus 로고
    • High laser-fluence deposition of organic materials in water ice matrices by "mAPLE"
    • DOI 10.1016/j.apsusc.2005.01.175, PII S0169433205001790
    • B. Toftmann, K. Rodrigo, J. Schou, and R. Pedrys, Appl. Surf. Sci. ASUSEE 0169-4332 247, 211 (2005). 10.1016/j.apsusc.2005.01.175 (Pubitemid 40743461)
    • (2005) Applied Surface Science , vol.247 , Issue.1-4 , pp. 211-216
    • Toftmann, B.1    Rodrigo, K.2    Schou, J.3    Pedrys, R.4
  • 8
    • 0000355897 scopus 로고
    • JVSTAL 0022-5355,. 10.1116/1.1315386
    • J. W. Coburn and E. Kay, J. Vac. Sci. Technol. JVSTAL 0022-5355 8, 738 (1971). 10.1116/1.1315386
    • (1971) J. Vac. Sci. Technol. , vol.8 , pp. 738
    • Coburn, J.W.1    Kay, E.2
  • 9
    • 0015483966 scopus 로고
    • JAPIAU 0021-8979,. 10.1063/1.1661054
    • J. W. Coburn and E. Kay, J. Appl. Phys. JAPIAU 0021-8979 43, 4965 (1972). 10.1063/1.1661054
    • (1972) J. Appl. Phys. , vol.43 , pp. 4965
    • Coburn, J.W.1    Kay, E.2
  • 11
    • 33846245069 scopus 로고    scopus 로고
    • Electron impact ionization cross-sections of toluene
    • DOI 10.1016/j.cplett.2006.12.014, PII S0009261406018069
    • J. R. Vacher, F. Jorand, N. Blin-Simiand, and S. Pasquiers, Chem. Phys. Lett. CHPLBC 0009-2614 434, 188 (2007). 10.1016/j.cplett.2006.12.014 (Pubitemid 46096904)
    • (2007) Chemical Physics Letters , vol.434 , Issue.4-6 , pp. 188-193
    • Vacher, J.R.1    Jorand, F.2    Blin-Simiand, N.3    Pasquiers, S.4
  • 12
    • 77952347513 scopus 로고
    • Gas Phase Ion-Molecule Reaction Rate Constants Through 1986.
    • I. Ikezoe, S. Matsuoka, M. Takebe, and A. Viggiano, Gas Phase Ion-Molecule Reaction Rate Constants Through 1986, 1987.
    • (1987)
    • Ikezoe, I.1    Matsuoka, S.2    Takebe, M.3    Viggiano, A.4
  • 13
  • 14
    • 0035400559 scopus 로고    scopus 로고
    • Carbon reactivity in an oxygen plasma: A comparison with reactivity in molecular oxygen
    • DOI 10.1016/S0008-6223(00)00235-9, PII S0008622300002359
    • A. Cuesta, A. Martinez-Alonso, and J. M. D. Tascon, Carbon CRBNAH 0008-6223 39, 1135 (2001). 10.1016/S0008-6223(00)00235-9 (Pubitemid 32427156)
    • (2001) Carbon , vol.39 , Issue.8 , pp. 1135-1146
    • Cuesta, A.1    Martinez-Alonso, A.2    Tascon, J.M.D.3
  • 17
    • 0030096316 scopus 로고    scopus 로고
    • Energy dependence of ion-induced sputtering yields from monatomic solids at normal incidence
    • DOI 10.1006/adnd.1996.0005
    • Y. Yamamura and H. Tawara, At. Data Nucl. Data Tables ADNDAT 0092-640X 62, 149 (1996). 10.1006/adnd.1996.0005 (Pubitemid 126171389)
    • (1996) Atomic Data and Nuclear Data Tables , vol.62 , Issue.2 , pp. 149-253
    • Yamamura, Y.1    Tawara, H.2
  • 18
    • 33751216772 scopus 로고    scopus 로고
    • Plasma diagnostics of hybrid magnetron sputtering and pulsed laser deposition
    • DOI 10.1016/j.surfcoat.2006.08.096, PII S0257897206008486
    • J. G. Jones, C. Muratore, A. R. Waite, and A. A. Voevodin, Surf. Coat. Technol. SCTEEJ 0257-8972 201, 4040 (2006). 10.1016/j.surfcoat.2006.08.096 (Pubitemid 44783115)
    • (2006) Surface and Coatings Technology , vol.201 , pp. 4040-4045
    • Jones, J.G.1    Muratore, C.2    Waite, A.R.3    Voevodin, A.A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.