Fluoro-silsesquioxane-urethane hybrid for thin film applications

ACS Applied Materials and Interfaces

Volumn 1, Issue 2, 2009, Pages 336-347

  Kannan, Aravindaraj G ^a   Choudhury, Namita Roy ^a   Dutta, Naba ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

FluoroPOSS; polyurethane hybrid; silsesquioxanes; thin films; ultrahydrophobicity

Indexed keywords

AFM; ATOMIC FORCE; CHAIN EXTENDERS; CONTACT ANGLE HYSTERESIS; DIFFRACTION TECHNIQUES; DIISOCYANATES; EFFECT OF ADDITION; FLUOROPOSS; FTIR; HYBRID THIN FILM; ISOBUTYL; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; POLYMERIZATION REACTION; POLYURETHANE HYBRID; PROTECTIVE THIN; SILSESQUIOXANES; SOLVENT RESISTANCE; THIN FILM INTERFACES; ULTRAHYDROPHOBICITY; WATER CONTACT ANGLE;

ANGLE MEASUREMENT; ATOMIC SPECTROSCOPY; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IODINE; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OLIGOMERS; ORGANIC COATINGS; REACTION KINETICS; RESONANCE; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

FLUORINE DERIVATIVE; ORGANOSILICON DERIVATIVE; URETHAN;

ARTICLE; CHEMISTRY; DIFFERENTIAL SCANNING CALORIMETRY; INFRARED SPECTROSCOPY; MASS SPECTROMETRY; NUCLEAR MAGNETIC RESONANCE; SURFACE PROPERTY; TEMPERATURE; X RAY DIFFRACTION;

CALORIMETRY, DIFFERENTIAL SCANNING; FLUORINE COMPOUNDS; NUCLEAR MAGNETIC RESONANCE, BIOMOLECULAR; ORGANOSILICON COMPOUNDS; SPECTROMETRY, MASS, MATRIX-ASSISTED LASER DESORPTION-IONIZATION; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES; TEMPERATURE; URETHANE; X-RAY DIFFRACTION;

EID: 77952309599     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am800056p     Document Type: Article

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