Microbridge and e-test opens defectivity reduction via improved nitration of photolithography fluids

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Mesawich, Michael ^a   Sevegney, Michael ^a   Gotlinsky, Barry ^a   Reyes, Santos ^b   Abbott, Patrick ^b   Marzani, Jeremy ^b   Rivera, Mario A ^b  

^a PALL CORPORATION   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

Bi layer resist; Filtration; Microbridge defects; Nylon 6,6; Ozonated UPW; PTFE

Indexed keywords

BI-LAYER RESIST; MICROBRIDGE DEFECTS; NYLON 6,6; OZONATED UPW; PTFE;

GELATION; KRYPTON; METAL RECOVERY; OPTICAL CABLES; PHOTORESISTS; POLYAMIDES; POROUS MATERIALS; RAYON; SEMICONDUCTOR DEVICE MANUFACTURE; WATER FILTRATION;

DEFECTS;

EID: 65849174602     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814374     Document Type: Conference Paper

References (3)

1. Gotlinsky, B., Mesawich, M., Hall, D., "The effectiveness of sub 50 nm filtration on reduced defectivity in advance lithography applications," Proc. Arch Interface Conf. (2003).
2. Umeda, T., Mizuno, Y., Tsuzuki, S., "Study on effective property of point of use filter for defectivity reduction in 75nm ArF lithography and 120nm KrF lithography," Proc. Fujifilm Interface Conf. (2006).
3. Pate, K., "Ozone compatibility study of DI water filters," Ultrapure Water Journal, 7(7), 42-50 (1990).