Yield management enhanced advanced process control system (YMeAPC) part I: Description and case study of feedback for optimized multiprocess control

IEEE Transactions on Semiconductor Manufacturing

Volumn 23, Issue 2, 2010, Pages 221-235

  Moyne, James ^a   Schulze, Brad ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS CONTROL; BEST PRACTICE; COMPLEX SCHEDULING; COMPONENT INTEGRATION; CONTROL SOLUTIONS; COST TARGETS; DESIGN CHANGE; DEVICE PERFORMANCE; EQUIPMENT ENGINEERING SYSTEMS; EVENT-BASED CONTROL SYSTEM; FAB PRODUCTIVITY; FEED BACK INFORMATION; LEVEL CONTROLLERS; MAINTENANCE MANAGEMENT; POST MORTEM; REDUCING COSTS; SEMICONDUCTOR MANUFACTURING; VIRTUAL METROLOGY; YIELD EXCURSIONS; YIELD MANAGEMENT; YIELD PREDICTION;

CONTROLLERS; COST REDUCTION; FORECASTING; INTELLIGENT CONTROL; MAINTENANCE; OPTIMIZATION; PLANT SHUTDOWNS; PRODUCTIVITY; USER INTERFACES;

PROCESS CONTROL;

EID: 77951986108     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2010.2041294     Document Type: Conference Paper

References (21)

1. D. Appello, V. Tancorre, G. Green, C. Hay, and E. Gizdarski, "Enabling effective yield learning through actual DFM-closure at the soc level," in Proc. IEEE/SEMI Adv. Semicond. Manuf. Conf. (ASMC 2007), Jun. 2007, pp. 148-152.
2. [Online]. Available: www.itrs.net
3. R. K. Nurani, A. J. Strojwas, W. P. Maly, C. Ouyang, W. Shindo, R. Akella, M. G. McIntyre, and J. Derrett, "In-line yield prediction methodologies using patterned wafer inspection information," IEEE Trans. Semicond. Manuf., vol.11, no.1, pp. 40-47, Feb. 1998.
4. M. Yu et al., "Yield aware process control," in Proc. AEC/APC Symp. XIX, Indian Wells, CA, Sep. 2007.
5. J. Moyne, "Yield management enhanced advanced process controlu (keynote)," in Proc. AEC/APC Symp. XX, Salt Lake City, UT, Oct. 2008.
6. J. Moyne, Yield Management Enhanced Advanced Process Control System (YMeAPC): Part II, Case Study of Feedback for Dymamic Scheduling/Dispatch Optimized to Yield Objectives (in preparation).
7. J. Moyne, "A blueprint for enterprise-wide deployment of advanced process control," Solid State Technol., vol.52, no.7, Jul. 2009.
8. N. Ward, "Future directions in APC from an equipment and APC supplier perspective (Keynote)," in Proc. AEC/APC Symp. XIX, Indian Wells, CA, Sep. 2007.
9. [Online]. Available: www.aecapcsymposium.org
10. SEMI E133: Provisional Standard for Automated Process Control Systems Interface, Semiconductor Equipment and Materials International Nov. 2007.
11. Service-Oriented Architecture: Concepts, Technology, and Design. Englewood Cliffs, NJ: Prentice-Hall, 2005, T Erl.
12. A. Khan, J. Moyne, and D. Tilbury, "Fab-wide control utilizing virtual metrology," IEEE Trans. Semicond. Manuf., pp. 364-375, Nov. 2007.
13. T.-H. Lin, F.-T. Cheng, A.-J.Ye,W.-M.Wu, and M.-H. Hung, "A novel key-variable sifting algorithm for virtual metrology," in Proc. IEEE Int. Conf. Robot. Autom. (ICRA) , May 2008, pp. 3636-3641.
14. K. P. Han, J. Moyne, S. Bushman, and T. Edgar, "Implementation of virtual metrology by selection of optimal adaptation method," in Proc. AEC/APC Symp. XX, Ann Arbor, MI, Sep. 2008.
15. H. Wijayah, K. Sukerkar, S. Gala, N. Arora, J. Moyne, D. Tilbury, and J. Luntz, "Reconfigurable factory-wide resource-based system integration for control," in Proc. IEEE Int. Electro/Inf. Technol. Conf., East Lansing, MI, May 2006.
16. J. Moyne, "The evolution of APC: The move to total factory control," Solid State Technol., vol.47, no.9, Sep. 2004.
17. B. S. Dayal and J. F. MacGregor, "Improved PLS algorithms," J. Chemometr. vol.11, no.1, pp. 73-85, 1997 [Online]. Available: http://www.chems.msu.edu/fac.pub/chan/MPLS-App.pdf [Online]. Available: http://www.mathworks.com/matlabcentral/fx-files/ 18760/1/content/html/ learningpcapls.html, See also for tutorials
18. Run-to-Run Control in Semiconductor Manufacturing, J. Moyne, E. Del Castillo, and A. Hurwitz, Eds. Boca Raton, FL: CRC, Nov. 2000.
19. A. Khan, J. Moyne, and D. Tilbury, "On the quality of virtual metrology data for use in the feedback process control," in Proc. AEC/APC Symp. XIX, Indian Wells, CA, Sep. 2007.
20. G. S. Baweja, "Real-time lot dispatching for semiconductor fab," Future Fab Int. , vol.11, Jun. 2001.
21. Book of SEMI Standards, Equipment Automation/Software 2009 [Online]. Available: www.semi.org/standards/standardspublications