Incident angle dependence in polymer TOF-SIMS depth profiling with C 60 ion beams

e-Journal of Surface Science and Nanotechnology

Volumn 7, Issue , 2009, Pages 878-881

  Iida, Shin Ichi ^a   Miyayama, Takuya ^a   Sanada, Noriaki ^a   Suzuki, Mineharu ^a   Fisher, Gregory L ^b   Bryan, Scott R ^b  

^a ULVAC PHI Inc   (Japan)

^b Physical Electronics Inc Minnesota   (United States)

Author keywords

C60; Incident angle dependence; Polymer depth profiling; TOF SIMS

Indexed keywords

INTERFACES (MATERIALS); ION BEAMS; ION BOMBARDMENT; POLYMERS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

CARBON DEPOSITION; DAMAGE ACCUMULATION; GLANCING ANGLE; INCIDENT ANGLES; MOLECULAR INFORMATION; SPUTTERING CONDITIONS; SURFACE NORMALS; TOF SIMS;

DEPTH PROFILING;

EID: 77951856889     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2009.878     Document Type: Article

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