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Applied Physics Letters

Volumn 96, Issue 15, 2010, Pages

Applying uniform reversible strain to epitaxial oxide films

(4) Biegalski, M D a Dorr K b Kim, D H c Christen, H M a

a OAK RIDGE NATIONAL LABORATORY (United States)

b Institute for Metallic Materials (Germany)

c Tulane University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; BIAXIAL IN-PLANE STRAIN; ELASTIC RESPONSE; IN-PLANE STRAINS; LATTICE STRUCTURES; PIEZOELECTRIC SUBSTRATES; QUANTITATIVE MEASUREMENT; REVERSIBLE STRAIN; SRTIO; STRAIN-DEPENDENT;

EPITAXIAL FILMS; LEAD; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 77951609046 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3374323 Document Type: Article

Times cited : (86)

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