Photobleaching-activated micropatterning on self-assembled monolayers

Journal of Physics Condensed Matter

Volumn 22, Issue 19, 2010, Pages

  Scrimgeour, Jan ^a   Kodali, Vamsi K ^a   Kovari, Daniel T ^a   Curtis, Jennifer E ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE SIZES; FLUORESCENCE MICROSCOPES; FUNCTIONAL CHEMICALS; LIGAND BINDING; LIGAND DENSITY; MICRO PATTERNING; MICROPATTERNS; SPATIAL GRADIENTS;

ELECTRON ENERGY LEVELS; FUNCTIONAL GROUPS; LIGANDS; PHOTOBLEACHING; SIGNAL TO NOISE RATIO;

SELF ASSEMBLED MONOLAYERS;

METHACRYLIC ACID DERIVATIVE;

ARTICLE; BLEACHING; CHEMISTRY; LIGHT; MATERIALS TESTING; RADIATION EXPOSURE; SURFACE PROPERTY;

LIGHT; MATERIALS TESTING; METHACRYLATES; PHOTOBLEACHING; SURFACE PROPERTIES;

EID: 77951529623     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/22/19/194103     Document Type: Article

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