Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

Molecular Crystals and Liquid Crystals

Volumn 520, Issue , 2010, Pages 231/[507]-238/[514]

  Choi, Seung Sock ^a,b   Lee, He Seung ^a   Kim, Eun Kyeong ^a   Baek, Kyung Youl ^a   Choi, Dong Hoon ^b   Hwang, Seung Sang ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

Dielectric material; Fluorine polymer; Silsesquioxane

Indexed keywords

CONDENSATION REACTIONS; LOW-K DIELECTRIC; PHOTONICS;

BASE CATALYST; CHEMICAL COMPOSITIONS; DIELECTRIC VALUES; HYDROLYSIS AND CONDENSATION; LOW DIELECTRIC CONSTANT MATERIALS; PHENYLSILSESQUIOXANE; SILSESQUIOXANES; SYNTHESIS AND CHARACTERIZATIONS;

DIELECTRIC MATERIALS;

EID: 77951448547     PISSN: 15421406     EISSN: 15635287     Source Type: Journal    
DOI: 10.1080/15421400903584507     Document Type: Article

References (10)

1. Xu, Y., Zheng, D. W., Tsai, Y., Tu, K. N., Zhao, B., Liu, Q. Z., Brongo, M., Ong, C. W., Choy, C. L., Sheng, G. T., & Tung, C. H. (2001). J. Electron. Mater., 30(4), 309.
2. Hougham, G. et al. (1999). Fluoropolymers 1: Synthesis, Plenum Press: New York.
3. Su, Y. C. & Chang, F. C. (2003). Polymer, 44(26), 7989.
4. Baklanov, M. et al. (2007). In: Dielectric Films for Advanced Microelectronics, A. Grill (Ed.), John Wiley & Sons: Canada, Chapter 1, 2.
5. Baney, R. H., Itoh, M., Sakakibara, A., & Suzuki, T. (1995). Chem.Rev., 95, 1409.
6. Choi, S. S., Lee, H. S., Mittal, A., Baek, K. Y., Choi, D. H., & Hwang, S. S. (2009). to be published.
7. Yamamoto, S., Yasuda, N., Ueyama, A., Adachi, H., & Ishikawa, M. (2004). Macromolecules., 37, 2775.
8. Park, E. S., Ro, H. W., Nguyen, C. V., Jaffe, R. L., & Yoon, D. Y. (2008). Chem Mater., 20, 1548.
9. Kim, Y. H., Hwang, M. S., Kim, H. J., Kim, J. Y., & Lee, Y. J. (2001). Appl Phys., 90, 3367.
10. Sun, J., Tang, H. D., Jiang, J. Q., Xie, P., Zhang, R. B., Fu, P. F., & Wu, Q. (2003). Polymer, 44, 2867.