Shaping of silicon crystals for channelling experiments through anisotropic chemical etching

Journal of Physics D: Applied Physics

Volumn 41, Issue 24, 2008, Pages

  Baricordi, S ^a   Guidi, V ^a   Mazzolari, A ^a   Vincenzi, D ^a   Ferroni, M ^b  

^a UNIVERSITY OF FERRARA   (Italy)

^b UNIVERSITY OF BRESCIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC CHEMICAL ETCHING; CRYSTAL QUALITIES; FLAT SURFACES; HADRON COLLIDERS; HIGH-ENERGY BEAMS; SILICON CRYSTAL; STRINGENT REQUIREMENT; SURFACE DAMAGES;

CRYSTALS; ELEMENTARY PARTICLES; ETCHING;

ANISOTROPY;

EID: 77951239041     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/24/245501     Document Type: Article

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