An electrochemical deposition route for obtaining α- Fe 2O3 thin films: II. EQCM study and semiconductor properties

Electrochemical and Solid-State Letters

Volumn 10, Issue 10, 2007, Pages

  Schrebler, Ricardo ^a   Llewelyn, Cynthia ^a   Vera, Francisca ^a   Cury, Paula ^a   Muñoz, Eduardo ^a   Del Río, Rodrigo ^b   Gómez Meier, Humberto ^a   Córdova, Ricardo ^a,d   Dalchiele, Enrique A ^c,d  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^b PONTIFICIA UNIVERSIDAD CATÓLICA DE CHILE   (Chile)

^c INSTITUTO DE FÍSICA   (Uruguay)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; GLASS; HEMATITE; QUARTZ CRYSTAL MICROBALANCES;

ELECTROLYTIC BATH; OXYHYDROXIDE IRON; PHOTOELECTROCHEMICAL MEASUREMENTS;

THIN FILMS;

EID: 34547849596     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2756160     Document Type: Article

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