A spectroscopic ellipsometry investigation of RF-sputtered crystalline vanadium pentoxide thin films

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1109-1112

  Oukassi, S ^a   Gagnard, X ^a   Salot, R ^b   Zahorski, D ^c   Stehle J L ^c   Piel, J P ^c   Pereira Ramos, J P ^d  

^a STMICROELECTRONICS   (France)

^b CEA GRENOBLE   (France)

^c SOPRA   (France)

^d CNRS Université Paris Est Créteil Val de Marne   (France)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; AFM; CRYSTALLINE THIN FILMS; EFFECTIVE MEDIA APPROXIMATION; ELECTROCHEMICAL PERFORMANCE; LITHIUM MICROBATTERIES; NEAR-IR; SEM; VANADIUM PENTOXIDE; VANADIUM PENTOXIDE THIN FILMS; VISIBLE RANGE;

CRYSTALLINE MATERIALS; FILM GROWTH; LITHIUM; OPTICAL CONSTANTS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

OPTICAL FILMS;

EID: 77951141774     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777744     Document Type: Conference Paper

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