Modifications and growth mechanisms of ultrathin aluminum oxide films on NiAl in water

Journal of Physical Chemistry C

Volumn 114, Issue 15, 2010, Pages 7132-7140

  Maurice, Vincent ^a   Bennour, Inès ^a   Zanna, Sandrine ^a   Klein, Lorena H ^a   Marcus, Philippe ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ALLOY COMPOSITIONS; ALUMINA FILMS; ALUMINA THIN FILMS; ALUMINUM OXIDE FILMS; ALUMINUM OXIDES; AMBIENT AIR; ANGLE-RESOLVED XPS; ANION TRANSPORT; CATION TRANSPORTS; CORE LEVEL SHIFTS; GROWTH MECHANISMS; INTERGRANULAR; ION TRANSPORTS; LIQUID WATER; LOW AIR PRESSURE; LOW PRESSURES; LOW VAPOR PRESSURES; NATIVE OXIDE FILM; OXIDE GRAINS; OXIDE SURFACE; OXYGEN DEFICIENCY; PREFERENTIAL GROWTH; PRESSURE GAP; ROOM TEMPERATURE; THERMAL OXIDE FILMS; THICK THERMAL OXIDES; ULTRA-THIN;

ALUMINA; ALUMINUM; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; HYDROXYLATION; LIQUIDS; MICROELECTROMECHANICAL DEVICES; MONOLAYERS; OPTICAL FILMS; OXYGEN; PHASE INTERFACES; PLANTS (BOTANY); STOICHIOMETRY; ULTRATHIN FILMS; WATER VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 77951104554     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1012544     Document Type: Article

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