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Volumn 384, Issue 1-3, 1997, Pages 106-119

Interaction of rhodium with hydroxylated alumina model substrates

Author keywords

Aluminum; Aluminum oxide; Chemisorption; Electron spectroscopy; Growth; Low energy electron diffraction; Rhodium; Soft X ray photo; Water

Indexed keywords

ALUMINA; ALUMINUM; BINDING ENERGY; CHEMISORPTION; DEPOSITION; ELECTRON ENERGY LEVELS; HYDROXYLATION; LOW ENERGY ELECTRON DIFFRACTION; OXIDATION; SUBSTRATES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0031185896     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00170-2     Document Type: Article
Times cited : (116)

References (49)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.