Infrared characterization of ZnO films on Si substrates

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 2, 2008, Pages 566-568

  Engelbrecht, J A A ^a   Roro, K T ^a   Swanepoel, R ^b  

^a NELSON MANDELA METROPOLITAN UNIVERSITY   (South Africa)

^b UNIVERSITY OF THE WESTERN CAPE   (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX DIELECTRIC FUNCTIONS; DIELECTRIC PARAMETERS; ENVELOPE METHOD; EXTINCTION COEFFICIENTS; INFRARED CHARACTERIZATION; INFRARED REFLECTANCE SPECTROSCOPY; INFRARED REGIONS; REFLECTANCE SPECTRUM; SI SUBSTRATES; ZNO FILMS;

CURVE FITTING; METALLIC FILMS; REFLECTION; REFRACTIVE INDEX; ZINC OXIDE;

INFRARED SPECTROSCOPY;

EID: 77951102930     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200776803     Document Type: Conference Paper

References (26)

1. D.C. Look, Mater. Sci. Eng. B 80, 383 (2001).
2. W.L. Bond, J. Appl. Phys. 36, 1674 (1965).
3. Y.S. Park, C.W. Litton, T.C. Collins, and D.C. Reynolds, Phys. Rev. 143, 512 (1966).
4. Y.S. Park and J.R. Schneider, J. Appl. Phys. 39, 3049 (1968).
5. W.Y. Liang and A.D. Yoffe, Phys. Lett. 20, 59 (1968).
6. R.L. Hengehold, R.J. Almassy, and F.L. Pedrotti, Phys. Rev. B 1, 4784 (1970).
7. R. Klucker, H. Nelkowski, Y.S. Park, M. Skibowski, and T.S. Wagner, phys. stat. sol. (b) 45, 265 (1971).
8. J.L. Freeouf, Phys. Rev. B 7, 3810 (1973).
9. K. Hümmer and P. Gebhardt, phys. stat. sol. (b) 85, 271 (1978).
10. H. Yoshikawa and S. Adachi, Jpn. J. Appl. Phys. 36, 6237 (1997).
11. T.C. Damen, S.P.S. Porto, and B. Tell, Phys. Rev. 142, 570 (1966).
12. E.C. Heltemes and H.L. Swinney, J. Appl. Phys. 38, 2387 (1967).
13. E.F. Venger, A.V. Melnichuk, L. Yu. Melnichuk, and Yu. A. Pasechnik, phys. stat. sol. (b) 188, 823 (1995).
14. P.Y. Emelie, J.D. Phillips, B. Buller, and U.D. Venkateswaran, J. Electron. Mater. 35, 525 (2006).
15. Y. Ma, T. Tsurumi, S. Nishizawa, N. Ohashi, and O. Fukunaga, J. Am. Ceram. Soc. 81, 2125 (1998).
16. E.M. Bacheri, G. Baud, S. Ben Amor, and M. Jaquet, Thin Solid Films 348, 165 (1999).
17. F.S. Shan and Y.S. Yu, Thin Solid Films 435, 126 (2003).
18. N.R. Aghamalyan, A. Bambaryan, E. Kh Goulanian, R.K. Hovsepyan, R.B. Kostanyan, S. I. Petrosyan, E.S. Vardanyan, and A.F. Zerrouk, Semicond. Sci. Technol. 18, 525 (2003).
19. Y.C. Liu, J.H. Hsieh, and S.K. Tung, Thin Solid Films 510, 32 (2006).
20. C. Gümüs, O.M. Ozkendir, H. Kavak, and Y. Ufuktepe, J. Optoelectron. Mater. 35, 299 (2006).
21. M. Caglar, Y. Caglar, and S. Ilican, J. Optoelectron. Adv. Mater. 8, 1410 (2006).
22. R.T. Holm, J.W. Gibson, and E.D. Palik, J. Appl. Phys. 48, 212 (1977).
23. J.A.A. Engelbrecht, I.G. Lee, and D.J.L. Venter, Infrared Phys. 27, 57 (1987).
24. J.C. Manifacier, J. Gasiot, and J.P. Fillard, J. Phys. E: Sci. Instrum. 9, 1002 (1976).
25. R. Swanepoel, J. Phys. E: Sci. Instrum. 16, 1214 (1983).
26. R. Swanepoel, S.A. J. Phys. 12, 148 (1989).