Etching and structure transformations in uncured epoxy resin under rf-plasma and plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 10, 2010, Pages 1568-1580

  Kondyurin, Alexey ^a   Bilek, Marcela ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Ellipsometry; Epoxy resin; Free space environment; Ion beam implantation; Spectroscopy

Indexed keywords

ARGON ION; CURING REACTIONS; FREE SPACE; FTIR SPECTROSCOPY; HARDENING AGENT; ION BEAM IMPLANTATION; ION BEAM IRRADIATION; MODIFIED EPOXY; PLASMA IMMERSION ION IMPLANTATION; RF PLASMA; SPACE ENVIRONMENT; STRUCTURAL TRANSFORMATION; STRUCTURE TRANSFORMATIONS;

ARGON; CARBONIZATION; ELLIPSOMETRY; EPOXY RESINS; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; ION IMPLANTATION; OPTICAL MICROSCOPY; PLASMA APPLICATIONS; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

RESINS;

EID: 77951023749     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2010.03.014     Document Type: Article

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