-
1
-
-
33646412624
-
-
C. Y. Chang, F. C. Tsao, C. J. Pan, G. C. Chi, H. T. Wang, J. J. Chen, F. Ren, D. P. Norton, S. J. Pearton, K. H. Chen, and L. C. Chen, Appl. Phys. Lett. 88, 173503 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 173503
-
-
Chang, C.Y.1
Tsao, F.C.2
Pan, C.J.3
Chi, G.C.4
Wang, H.T.5
Chen, J.J.6
Ren, F.7
Norton, D.P.8
Pearton, S.J.9
Chen, K.H.10
Chen, L.C.11
-
4
-
-
25144462707
-
-
U. Özgur, Ya. I. Alivov, C. Liu, A. Teke, M. Reshchikov, S. Dogan, V. Avrutin, S. J. Cho, and H. Morkoç, J. Appl. Phys. 98, 041301 (2005).
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 041301
-
-
Özgur, U.1
Alivov, Ya.I.2
Liu, C.3
Teke, A.4
Reshchikov, M.5
Dogan, S.6
Avrutin, V.7
Cho, S.J.8
Morkoç, H.9
-
7
-
-
57049161361
-
-
J. Elias, R. Tena-Zaera, G.-Y. Wang, and C. Lévy-Clément, Chem. Mater. 20, 6633 (2008).
-
(2008)
Chem. Mater.
, vol.20
, pp. 6633
-
-
Elias, J.1
Tena-Zaera, R.2
Wang, G.-Y.3
Lévy-Clément, C.4
-
8
-
-
33846600505
-
-
L. Yu, G. Zhang, S. Li, Z. Xi, and D. Guo, J. Cryst. Growth 299, 184 (2007).
-
(2007)
J. Cryst. Growth
, vol.299
, pp. 184
-
-
Yu, L.1
Zhang, G.2
Li, S.3
Xi, Z.4
Guo, D.5
-
9
-
-
34147102794
-
-
L. Xu. Liao, Q. Zhang, J. X. Ai, and D. Xu, J. Phys. Chem. C 111, 4549 (2007).
-
(2007)
J. Phys. Chem. C
, vol.111
, pp. 4549
-
-
Liao, L.Xu.1
Zhang, Q.2
Ai, J.X.3
Xu, D.4
-
10
-
-
0035676915
-
-
L. Vayssieres, K. Keis, A. Hagfeldt, and S. Lindquist, Chem. Mater. 13, 4395 (2001).
-
(2001)
Chem. Mater.
, vol.13
, pp. 4395
-
-
Vayssieres, L.1
Keis, K.2
Hagfeldt, A.3
Lindquist, S.4
-
11
-
-
33846849031
-
-
Y. Tang, L. Luo, Z. Chen, Y. Jiang, B. Li, Z. Jia, and L. Xu, J. Electrochem. Commun. 9, 289 (2007).
-
(2007)
J. Electrochem. Commun.
, vol.9
, pp. 289
-
-
Tang, Y.1
Luo, L.2
Chen, Z.3
Jiang, Y.4
Li, B.5
Jia, Z.6
Xu, L.7
-
12
-
-
67649815926
-
-
C. H. Ahn, Y. Yi. Kim, D. C. Kim, S. K. Mohanta, and H. K. Cho, J. Appl. Phys. 105, 013502 (2009).
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 013502
-
-
Ahn, C.H.1
Kim, Y.Yi.2
Kim, D.C.3
Mohanta, S.K.4
Cho, H.K.5
-
13
-
-
43949095841
-
-
Q. L. Gu, C. K. Cheung, C. C. Ling, A. M. C. Ng, A. B. Djurišić, L.W. Lu, X. D. Chen, S. Fung, C. D. Beling, and H. C. Ong, J. Appl. Phys. 103, 093706 (2008).
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 093706
-
-
Gu, Q.L.1
Cheung, C.K.2
Ling, C.C.3
Ng, A.M.C.4
Djurišić, A.B.5
Lu, L.W.6
Chen, X.D.7
Fung, S.8
Beling, C.D.9
Ong, H.C.10
-
14
-
-
24144453586
-
-
H. L. Mosbacker, Y. M. Strzhemechny, B. D. White, P. E. Smith, D. C. Look, D. C. Reynolds, and C. W. Litton, Appl. Phys. Lett. 87, 012102 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 012102
-
-
Mosbacker, H.L.1
Strzhemechny, Y.M.2
White, B.D.3
Smith, P.E.4
Look, D.C.5
Reynolds, D.C.6
Litton, C.W.7
-
17
-
-
38849184302
-
-
N. Koteeswara Reddy, Q. Ahsanulhaq, J. H. Kim, and Y. B. Hahn, Appl. Phys. Lett. 92, 043127 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 043127
-
-
Koteeswara Reddy, N.1
Ahsanulhaq, Q.2
Kim, J.H.3
Hahn, Y.B.4
-
21
-
-
36749005081
-
-
H. Zeng, Z. Li, W. Cai, and P. Liu, J. Appl. Phys. 102, 104307 (2007).
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 104307
-
-
Zeng, H.1
Li, Z.2
Cai, W.3
Liu, P.4
-
23
-
-
67650229986
-
-
H. Noor, P. Klason, O. Nur, Q. Wahab, M. Asghar, and M. Willander, J. Appl. Phys. 105, 123510 (2009).
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 123510
-
-
Noor, H.1
Klason, P.2
Nur, O.3
Wahab, Q.4
Asghar, M.5
Willander, M.6
-
24
-
-
33947510248
-
-
A. B. Djurisic, Y. H. Leung, K. H. Tam, Y. F. Hsu, L. Ding, W. K. Ge, Y. C. Zhong, K. S. Wong, W. K. Chan, H. L. Tam, K. W. Cheah, W. M. Kwok, and D. L. Phillips, Nanotechnology 18, 095702 (2007).
-
(2007)
Nanotechnology
, vol.18
, pp. 095702
-
-
Djurisic, A.B.1
Leung, Y.H.2
Tam, K.H.3
Hsu, Y.F.4
Ding, L.5
Ge, W.K.6
Zhong, Y.C.7
Wong, K.S.8
Chan, W.K.9
Tam, H.L.10
Cheah, K.W.11
Kwok, W.M.12
Phillips, D.L.13
-
25
-
-
70249144677
-
-
M. Willander, O. Nur, Q. X. Zhao, L. L. Yang, M. Lorenz, B. Q. Cao, J. Zúñiga Pérez, C. Czekalla, G. Zimmermann, M. Grundmann, A. Bakin, A. Behrends, M. Al-Suleiman, A. El-Shaer, A. Che Mofor, B. Postels, A. Waag, N. Boukos, A. Travlos, H. S. Kwack, J. Guinard, and D. Le Si Dang, Nanotechnology 20, 332001 (2009).
-
(2009)
Nanotechnology
, vol.20
, pp. 332001
-
-
Willander, M.1
Nur, O.2
Zhao, Q.X.3
Yang, L.L.4
Lorenz, M.5
Cao, B.Q.6
Zúñiga Pérez, J.7
Czekalla, C.8
Zimmermann, G.9
Grundmann, M.10
Bakin, A.11
Behrends, A.12
Al-Suleiman, M.13
El-Shaer, A.14
Che Mofor, A.15
Postels, B.16
Waag, A.17
Boukos, N.18
Travlos, A.19
Kwack, H.S.20
Guinard, J.21
Le Si Dang, D.22
more..
-
26
-
-
77951016793
-
-
N. Bano, I. Hussain, O. Nur, M. Willander, Q. Wahab, A. Henry, H. S. Kwack, and d. Le Si Dang, in press (2009)
-
N. Bano, I. Hussain, O. Nur, M. Willander, Q. Wahab, A. Henry, H. S. Kwack, and d. Le Si Dang, in press (2009).
-
-
-
-
28
-
-
39349094337
-
-
C. Li, G. Fang, J. Li, L. Ai, B. Dong, and X. Zhao, J. Phys. Chem. C 112, 990 (2008).
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 990
-
-
Li, C.1
Fang, G.2
Li, J.3
Ai, L.4
Dong, B.5
Zhao, X.6
-
30
-
-
68149112646
-
-
H. Guo, Z. Lin, Z. Feng, L. Lin, and J. Zhou, J. Phys. Chem. C 113, 12546 (2009).
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 12546
-
-
Guo, H.1
Lin, Z.2
Feng, Z.3
Lin, L.4
Zhou, J.5
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