Viscoelastic and dielectric behaviour of thin films made from siloxane-containing poly(oxadiazole-imide)s

European Polymer Journal

Volumn 46, Issue 5, 2010, Pages 1049-1062

  Damaceanu, Mariana Dana ^a   Musteata, Valentina Elena ^a   Cristea, Mariana ^a   Bruma, Maria ^a  

^a PETRU PONI INSTITUTE OF MACROMOLECULAR CHEMISTRY   (Romania)

Author keywords

Dielectric properties; Poly(oxadiazole imide)s; Relaxation; Tensile properties; Viscoelastic properties

Indexed keywords

DIELECTRIC BEHAVIOUR; DIELECTRIC CONSTANT VALUES; FLEXIBLE FILMS; FREQUENCY DOMAINS; HIGH THERMAL STABILITY; INITIAL DECOMPOSITION TEMPERATURES; MECHANICAL ANALYSIS; OXADIAZOLES; POLY(OXADIAZOLE-IMIDE)S; POLYCONDENSATION REACTIONS; ROOM TEMPERATURE; VISCOELASTIC PROPERTIES;

ACTIVATION ANALYSIS; ACTIVATION ENERGY; DIELECTRIC DEVICES; DIELECTRIC LOSSES; ELECTRIC GENERATORS; GLASS; GLASS TRANSITION; PERMITTIVITY; POLYCONDENSATION; POLYIMIDES; THERMOGRAVIMETRIC ANALYSIS; VISCOELASTICITY;

MECHANICAL PROPERTIES;

EID: 77950864257     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2010.01.020     Document Type: Article

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