Enhanced antireflection properties of silica thin films via redox deposition and hot-water treatment

Solar Energy Materials and Solar Cells

Volumn 94, Issue 6, 2010, Pages 1055-1058

  Chigane, Masaya ^a   Hatanaka, Yoshiro ^a   Shinagawa, Tsutomu ^a  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Cetyltrimethylammonium bromide; Rectification property; Redox deposition; Silicon oxide; Thin film

Indexed keywords

AMMONIUM HEXAFLUOROSILICATE; ANTI-REFLECTION; AQUEOUS SOLUTIONS; BEFORE AND AFTER; CETYL TRIMETHYL AMMONIUM BROMIDES; CETYLTRIMETHYLAMMONIUM BROMIDE; DEPTH PROFILE; DIMETHYLAMINE BORANE; EFFECTIVE MEDIUM APPROXIMATION; HOT WATER TREATMENT; POLY(ETHYLENE TEREPHTHALATE) SUBSTRATE; POROUS SILICA FILMS; POST-DEPOSITION; RECTIFICATION PROPERTIES; RECTIFICATION PROPERTY; REFRACTIVE INDEX DISPERSION; SILICA THIN FILMS; SILICON OXIDE THIN FILMS; X-RAY PHOTOELECTRONS;

AMMONIUM COMPOUNDS; DISSOLUTION; ETHYLENE; POLYETHYLENE TEREPHTHALATES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON OXIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; WATER; WATER TREATMENT; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 77950862616     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.02.024     Document Type: Article

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