Nanoimprinting pre-patterned effects on anodic aluminum oxide

Japanese Journal of Applied Physics

Volumn 49, Issue 1 Part 1, 2010, Pages

  Chen, Sheng Hui ^a   Chan, Der Sheng ^b   Chen, Chun Ko ^a   Chang, Te Hung ^a   Lai, Yuh Hui ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b LEE MING INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM SURFACE; ANODIC ALUMINUM OXIDE; ANODIZATION PROCESS; APPLIED VOLTAGES; HIGH ORDER; INTERPORE DISTANCES; NANO-IMPRINT; NANO-IMPRINTING; NANO-STRUCTURED; PATTERN DESIGNS; SIMULATION RESULT; TWO-DIMENSIONAL STRUCTURES;

ANNEALING; DISSOLUTION; OXIDES; TWO DIMENSIONAL;

ALUMINUM;

EID: 77950848200     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.015201     Document Type: Article

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