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Japanese Journal of Applied Physics

Volumn 49, Issue 1 Part 2, 2010, Pages

Polymerie film deposition by coevaporation of polymerizable monomer and initiator

(4) Muroyama, Masakazu a,b Yokokura, Seiji b Tanaka, Kuniaki b Usui, Hiroaki b

a SONY CORPORATION (Japan)

b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBAZOL; CO-EVAPORATIONS; DOT PATTERNS; ETHYLMETHACRYLATE; FILM DEPOSITION; FUNCTIONAL MONOMER; INITIATOR CONCENTRATION; IR ANALYSIS; IRRADIATION POWER; MICRON SCALE; NOVEL METHODS; ORGANIC FILMS; PHOTOSENSITIVE LAYERS; SHADOW MASK; TETRA-HYDROFURAN; UV IRRADIATION;

DEPOSITION; FUNCTIONAL POLYMERS; IRRADIATION; LIGHT SENSITIVE MATERIALS; MONOMERS; PHOTOSENSITIVITY; PLASTIC FILMS; POLYMER FILMS; POLYMERIC FILMS; POLYMERIZATION;

POLYMERS;

EID: 77950798686 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.01AE03 Document Type: Article

Times cited : (7)

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