Thermo-induced hydrophilicity of nano-TiO2 thin films prepared by RF magnetron sputtering

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 848-852

  Meng, Fanming ^a,b   Xiao, Lei ^a   Sun, Zhaoqi ^a  

^a ANHUI UNIVERSITY   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Atomic force microscopy; Crystal growth; Surfaces and interfaces; Thin films; X ray diffraction

Indexed keywords

AMBIENT AIR; ANATASE PHASE; ATOMIC FORCE MICROSCOPES; MASS FRACTION; NANO-TIO; QUARTZ SUBSTRATE; RF-MAGNETRON SPUTTERING; RUTILE PHASE; SURFACES AND INTERFACES; TIO; WATER CONTACT ANGLE; X RAY DIFFRACTOMETERS; X-RAY PHOTOELECTRON SPECTROMETERS;

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMS; CONTACT ANGLE; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; CRYSTALLIZATION; DIFFRACTION; GRAIN BOUNDARIES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROPHILICITY; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE MINERALS; PHASE INTERFACES; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SURFACE TOPOGRAPHY; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION;

X RAY APPARATUS;

EID: 72049106097     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.06.107     Document Type: Article

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