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Volumn 256, Issue 13, 2010, Pages 4334-4338

Deposition of thick and adherent Teflon-like coating on industrial scale stainless steel shell using pulsed dc and RF PECVD

(4) Satyaprasad, A a Nema, S K a Sinha, N K b Raj, Baldev b

a INSTITUTE FOR PLASMA RESEARCH (India)

b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH (India)

Author keywords

Box coater; PECVD; Plasma; Pulsed dc; RF; Teflon like coating

Indexed keywords

COATINGS; ELECTRIC DISCHARGES; ELECTRIC GROUNDING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYTETRAFLUOROETHYLENES; STAINLESS STEEL; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

BOX COATER; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); PRECURSOR MOLECULES; PULSED DC; PULSED-DC DISCHARGE; RADIO FREQUENCY DISCHARGES; SURFACE ROUGHNESS (RA); TEFLON-LIKE COATINGS;

PLASMA CVD;

EID: 77950517156 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.02.027 Document Type: Article

Times cited : (8)

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