Electron beam lithography system for nanometer fabrication

Hitachi Review

Volumn 48, Issue 6, 1999, Pages 340-343

  Matsuzaka, Takashi ^a,b   Soda, Yasunari ^b,c  

^a Instrument Group   (Japan)

^b JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^c Hitachis Central Research Laboratory   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASKMAKING; PATTERN GENERATION; RESOLUTION ENHANCED TECHNOLOGIES; WAFERSURFACE;

ELECTRON SCATTERING; EXCIMER LASERS; INTEGRATED CIRCUITS; MASKS; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY; RANDOM ACCESS STORAGE; SENSITIVITY ANALYSIS; THROUGHPUT;

ELECTRON BEAMS;

EID: 0038330797     PISSN: 0018277X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. The International Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, CA, 1998.
2. H. Itoh, et al., J. of Vacuum Science Technology, B10 (6), (1992).
3. R. Akaba, et al., Electronic Parts and Materials, pp. 59-64 (March 1999).
4. F. Murai, et al., J. of Vacuum Science Technology, B10 (6), (1992).