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Volumn 21, Issue 4, 2010, Pages 349-354
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Orthogonal analysis for perovskite structure microwave dielectric ceramic thin films fabricated by the RF magnetron-sputtering method
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPREHENSIVE EVALUATION;
DIELECTRIC THIN FILMS;
FILM QUALITY;
MICROWAVE DIELECTRIC CERAMICS;
OPTIMAL PROCESS;
ORTHOGONAL ANALYSIS;
PEROVSKITE STRUCTURES;
PROCESS PARAMETERS;
RADIO FREQUENCY MAGNETRON SPUTTERING;
RF MAGNETRONS;
RF-MAGNETRON SPUTTERING;
SPUTTERING METHODS;
SPUTTERING POWER;
SPUTTERING PRESSURES;
SUBSTRATE TEMPERATURE;
WORKING GAS;
CERAMIC MATERIALS;
MAGNETRON SPUTTERING;
MICROWAVES;
OXIDE MINERALS;
PEROVSKITE;
PRESSURE EFFECTS;
SILICON COMPOUNDS;
SUBSTRATES;
THIN FILMS;
DIELECTRIC MATERIALS;
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EID: 77950369762
PISSN: 09574522
EISSN: 1573482X
Source Type: Journal
DOI: 10.1007/s10854-009-9919-y Document Type: Article |
Times cited : (79)
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References (9)
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