Reduced saturation magnetization in cobalt antidot thin films prepared by polyethylene oxide-assisted self-assembly of polystyrene nanospheres

Applied Physics Letters

Volumn 96, Issue 12, 2010, Pages

  Ho, Chi Chih ^a   Hsieh, Tung Wu ^a   Kung, Hsiang Hsi ^a   Juan, Wen Tau ^a   Lin, Keng Hui ^a,b   Lee, Wei Li ^a  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIDOT DIAMETER; ANTIDOTS; BULK VOLUME; COBALT ATOMS; COBALT THIN FILMS; CROSSOVER BEHAVIOR; D ELECTRONS; ITINERANT ELECTRONS; LARGE ARRAYS; MAGNETIZATION REVERSAL PROCESS; METAL INTERFACE; NANOSTRUCTURED THIN FILM;

COBALT; MAGNETIZATION REVERSAL; NANOSPHERES; OXIDE FILMS; POLYETHYLENE GLYCOLS; POLYETHYLENE OXIDES; POLYSTYRENES; SELF ASSEMBLY; SUPERCONDUCTING MATERIALS; THIN FILMS;

SATURATION MAGNETIZATION;

EID: 77950329779     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3371692     Document Type: Article

References (13)

1. F. Huang, M. T. Kief, G. J. Mankey, and R. F. Willis, Phys. Rev. B PRBMDO 0163-1829 49, 3962 (1994). 10.1103/PhysRevB.49.3962
2. J. P. Bucher, D. C. Douglass, and L. A. Bloomfield, Phys. Rev. Lett. PRLTAO 0031-9007 66, 3052 (1991) 10.1103/PhysRevLett.66.3052; J. Merikoski, J. Timonen, M. Manninen, and P. Jena, Phys. Rev. Lett. PRLTAO 0031-9007 66, 938 (1991). 10.1103/PhysRevLett.66.938
3. Y. Xia, B. Gates, Y. Yin, and Y. Lu, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 12, 693 (2000). 10.1002/(SICI)1521-4095(200005)12:10<693::AID- ADMA693>3.0.CO;2-J
4. J. C. Hulteen and R. P. Van Duyne, J. Vac. Sci. Technol. A JVTAD6 0734-2101 13, 1553 (1995). 10.1116/1.579726
5. C. -W. Kuo, J. Y. Shiu, Y. H. Cho, and P. Chen, Adv. Mater. ADVMEW 0935-9648 15, 1065 (2003). 10.1002/adma.200304824
6. A. S. Dimitrov and K. Nagayama, Langmuir LANGD5 0743-7463 12, 1303 (1996) 10.1021/la9502251; S. M. Weekes, F. Y. Ogrin, W. A. Murray, and P. S. Keatley, Langmuir LANGD5 0743-7463 23, 1057 (2007) 10.1021/la061396g; F. Pan, J. Zhang, C. Cai, and T. Wang, Langmuir LANGD5 0743-7463 22, 7101 (2006). 10.1021/la053323n
7. D. Qiu, T. Cosgrove, P. Revell, and I. Howell, Macromolecules MAMOBX 0024-9297 42, 547 (2009). 10.1021/ma802237p
8. M. Kläui, J. Rothman, L. Lopez-Diaz, C. A. F. Vaz, and J. A. C. Bland, Appl. Phys. Lett. APPLAB 0003-6951 78, 3268 (2001) 10.1063/1.1361282; F. Q. Zhu, G. W. Chern, O. Tchernyshyov, X. C. Zhu, J. G. Zhu, and C. L. Chien, Phys. Rev. Lett. PRLTAO 0031-9007 96, 027205 (2006). 10.1103/PhysRevLett.96. 027205
9. L. I. Balcells, B. Martinez, O. Iglesias, J. M. Garcia-Martin, A. Cebollada, A. Garcia-Martin, G. Armelles, B. Sepulveda, and Y. Alaverdyan, Appl. Phys. Lett. APPLAB 0003-6951 94, 062502 (2009) 10.1063/1.3078411; D. Buntinx, S. Brems, A. Volodin, K. Temst, and C. Van Haesendonck, Phys. Rev. Lett. PRLTAO 0031-9007 94, 017204 (2005). 10.1103/PhysRevLett.94.017204
10. I. Guedes, M. Grimsditch, V. Metlushko, P. Vavassori, R. Camley, B. Ilic, P. Neuzil, and R. Kumar, Phys. Rev. B PRBMDO 0163-1829 66, 014434 (2002) 10.1103/PhysRevB.66.014434; P. Vavassori, G. Gubbiotti, G. Zangari, C. T. Yu, H. Yin, H. Jiang, and G. j. Mankey, J. Appl. Phys. JAPIAU 0021-8979 91, 7992 (2002) 10.1063/1.1453321; C. C. Wang, A. O. Adeyeye, and N. Singh, Nanotechnology NNOTER 0957-4484 17, 1629 (2006). 10.1088/0957-4484/17/6/015
11. J. Nogús and I. K. Schuller, J. Magn. Magn. Mater. JMMMDC 0304-8853 192, 203 (1999). 10.1016/S0304-8853(98)00266-2
12. J. Tersoff and L. M. Falicov, Phys. Rev. B PRBMDO 0163-1829 26, 6186 (1982) 10.1103/PhysRevB.26.6186; for a review, see R. C. O. Handley, Modern Magnetic Materials (John Wiley and Sons, Hoboken, 1999), Chap..
13. See supplementary material at http://dx.doi.org/10.1063/1.3371692 E-APPLAB-96-074012 for SEM image analysis and vector VSM results.