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Volumn 121, Issue 3, 2010, Pages 453-458

Characterisation of amorphous silica in air-oxidised Ti3SiC2 at 500-1000 °C using secondary-ion mass spectrometry, nuclear magnetic resonance and transmission electron microscopy

Author keywords

Amorphous silica; NMR; Oxidation; SIMS; Ti3SiC2

Indexed keywords

AMORPHOUS SILICA; CHARACTERISATION; DUPLEX STRUCTURES; DYNAMIC SIMS; MAGIC ANGLE SPINNING; MIXED LAYER; SYNCHROTRON RADIATION DIFFRACTIONS; TEM; TEMPERATURE RANGE; TIO;

EID: 77950296778     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.02.005     Document Type: Article
Times cited : (7)

References (33)
  • 21
    • 77950301089 scopus 로고    scopus 로고
    • www.veeco.com/library/Learning_Center/Growth_Information/Vapor_Pressure_ Data_For_Selected_Elements/index.aspx.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.