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Volumn 121, Issue 3, 2010, Pages 453-458
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Characterisation of amorphous silica in air-oxidised Ti3SiC2 at 500-1000 °C using secondary-ion mass spectrometry, nuclear magnetic resonance and transmission electron microscopy
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Author keywords
Amorphous silica; NMR; Oxidation; SIMS; Ti3SiC2
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Indexed keywords
AMORPHOUS SILICA;
CHARACTERISATION;
DUPLEX STRUCTURES;
DYNAMIC SIMS;
MAGIC ANGLE SPINNING;
MIXED LAYER;
SYNCHROTRON RADIATION DIFFRACTIONS;
TEM;
TEMPERATURE RANGE;
TIO;
NUCLEAR MAGNETIC RESONANCE;
NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY;
OXIDATION;
RESONANCE;
SCANNING ELECTRON MICROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
SILICA;
SILICON CARBIDE;
SPECTROMETRY;
TRANSMISSION ELECTRON MICROSCOPY;
AMORPHOUS SILICON;
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EID: 77950296778
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matchemphys.2010.02.005 Document Type: Article |
Times cited : (7)
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References (33)
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