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Volumn 7, Issue 1, 2010, Pages 112-115

Ni based planar Schottky diodes on gallium nitride (GaN) grown on sapphire

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TIME; BARRIER HEIGHTS; IDEALITY FACTORS; LIFT-OFF PROCESS; METALLIC CONTACTS; MOCVD; PLANAR SCHOTTKY DIODES; PROCESS PARAMETERS; SCHOTTKY; SCHOTTKY CONTACTS; SCHOTTKY STRUCTURES;

EID: 77949730354     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982621     Document Type: Conference Paper
Times cited : (17)

References (9)
  • 1
    • 77949727725 scopus 로고    scopus 로고
    • M. E. Lin, S. Strite, and H. Morkoc, in: The Encyclopedia of Advanced Materials, D. Bloor, M. C. Fleming, R. I. Brook, and S. Mahajan (eds.), R. W. Cahn (senior ed.) (Pergamon Press, 1994), pp. 79-86.
    • M. E. Lin, S. Strite, and H. Morkoc, in: The Encyclopedia of Advanced Materials, D. Bloor, M. C. Fleming, R. I. Brook, and S. Mahajan (eds.), R. W. Cahn (senior ed.) (Pergamon Press, 1994), pp. 79-86.
  • 4
    • 77949759547 scopus 로고    scopus 로고
    • S.P. DenBaars, T. Katona, P. Cantu, A. Hanlon, S. Keller, M. Schmidt, T. Margalith, M. Pattisson, C. Moe, J. Speck, and S. Nakamura. Electron Devices Meeting, Technical Digest. IEEE Internat. 16.1.1 16.1.3 (2003).
    • S.P. DenBaars, T. Katona, P. Cantu, A. Hanlon, S. Keller, M. Schmidt, T. Margalith, M. Pattisson, C. Moe, J. Speck, and S. Nakamura. Electron Devices Meeting, Technical Digest. IEEE Internat. 16.1.1 16.1.3 (2003).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.