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Volumn 7, Issue 1, 2010, Pages 112-115
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Ni based planar Schottky diodes on gallium nitride (GaN) grown on sapphire
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING TIME;
BARRIER HEIGHTS;
IDEALITY FACTORS;
LIFT-OFF PROCESS;
METALLIC CONTACTS;
MOCVD;
PLANAR SCHOTTKY DIODES;
PROCESS PARAMETERS;
SCHOTTKY;
SCHOTTKY CONTACTS;
SCHOTTKY STRUCTURES;
ARGON;
CHEMICAL VAPOR DEPOSITION;
DISTILLATION;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
SEMICONDUCTOR DIODES;
SURFACE CLEANING;
SCHOTTKY BARRIER DIODES;
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EID: 77949730354
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200982621 Document Type: Conference Paper |
Times cited : (17)
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References (9)
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