Ablation and deposition of poly(dimethylsiloxane) with X-rays

ChemPhysChem

Volumn 11, Issue 1, 2010, Pages 115-118

  Weon, Byung Mook ^a,b   Kwon, Yong Bum ^a   Won, Kyu Hwang ^a   Yoo, Jewon ^a   Je, Jung Ho ^a   Li, Ming ^a   Hahn, Jong Hoon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b HARVARD UNIVERSITY   (United States)

Author keywords

Ablation; Deposition; Polymers; Surface chemistry; X rays

Indexed keywords

ABLATION; DEPOSITION; POLYMERS; SURFACE CHEMISTRY;

X RAYS;

DIMETICONE; POLYMER;

ADSORPTION; ARTICLE; CHEMISTRY; HYDROPHOBICITY; RADIATION EXPOSURE; STATIC ELECTRICITY; SURFACE PROPERTY; X RAY;

ADSORPTION; DIMETHYLPOLYSILOXANES; HYDROPHOBICITY; POLYMERS; STATIC ELECTRICITY; SURFACE PROPERTIES; X-RAYS;

EID: 77949516227     PISSN: 14394235     EISSN: 14397641     Source Type: Journal    
DOI: 10.1002/cphc.200900841     Document Type: Article

References (29)

1. a) D. Qin, Y. Xia, G. M. Whitesides, Adv. Mater. 1996, 8, 917-921.
2. b) Y. Xia, G. M. Whitesides, Angew. Chem. Int. Ed. Engl. 1998, 37, 551-575.
3. Y. Xia, G. M. Whitesides, Angew. Chem. 1998, 110, 568-594.
4. J. C. McDonald, D. C. Duffy, J. R. Anderson, D. T. Chiu, H. Wu, O. J. A. Schueller, G. M. Whitesides, Electrophoresis 2000, 21, 27-40.
5. H. Makamba, J. H. Kim, K. Lim, N. Park, J. H. Hahn, Electrophoresis 2003, 24, 3607-3619.
6. J. A. Vickers, M. M. Caulum, C. S. Henry, Anal. Chem. 2006, 78, 7446-7452.
7. A. Doerr, Nat. Methods 2009, 6, 194-194.
8. N. Bowden, A. Terfort, J. Carbeck, G. M. Whitesides, Science 1997, 276, 233-235.
9. a) H. Hillborg, U. W. Gedde, Polymer 1998, 39, 1991-1998.
10. b) J. Kim, M. K. Chaudhury, M. J. Owen, J. Colloid Interface Sci. 2000, 226, 231-236.
11. a) K. Efimenko, W. E. Wallace, J. Genzer, J. Colloid Interface Sci. 2002, 254, 306-315.
12. b) Y. Berdichevsky, J. Khandurina, A. Guttman, Y.-H. Lo, Sens. Actuators B 2004, 97, 402-408.
13. a) V.-M. Graubner, R. Jordan, O. Nuyken, B. Schnyder, T. Lippert, R. Kotz, A. Wokaun, Macromolecules 2004, 37, 5936-5943.
14. b) V.-M. Graubner, O. Nuyken, T. Lippert, A. Wokaun, S. Lazare, L. Servant, Appl. Surf. Sci. 2006, 252, 4781-4785.
15. c) T. Lippert, Plasma Processes Polym. 2005, 2, 525-546.
16. a) A. A. Miller, J. Am. Chem. Soc. 1960, 82, 3519-3523.
17. b) A. A. Miller, J. Am. Chem. Soc. 1961, 83, 31-36.
18. L. N. Pankratova, L. T. Bugaenko, A. A. Revina, High Energy Chem. 2000, 34, 16-22.
19. a) B. M. Weon, J. H. Je, Y. Hwu, G. Margaritondo, Phys. Rev. Lett. 2008, 100, 217403.
20. b) B. M. Weon, J. H. Je, Y. Hwu, G. Margaritondo, Appl. Phys. Lett. 2008, 92, 104101.
21. c) B. M. Weon, J. H. Je, Appl. Phys. Lett. 2008, 93, 244105.
22. Y. B. Kwon, B. M. Weon, K. H. Won, J. H. Je, Y. Hwu, G. Margaritondo, Langmuir 2009, 25, 1927-1929.
23. B. M. Weon, S. Chang, J. Yeom, S. K. Hahn, J. H. Je, Y. Hwu, G. Margaritondo, J. Appl. Phys. 2009, 106, 053518.
24. K. G. Marinova, D. Christova, S. Tcholakova, E. Efremov, N. D. Denkov, Langmuir 2005, 21, 11729-11737.
25. a) H. Y. Erbil, A. L. Demirel, Y. Avci, O. Mert, Science 2003, 299, 1377-1380.
26. b) A. R. Wheeler, Science 2008, 322, 539-540.
27. H.-P. Brack, C. Padeste, M. Slaski, S. Alkan, H. Solak, J. Am. Chem. Soc. 2004, 126, 1004-1005.
28. M. Yamamoto, M. Yamada, N. Nobuhiro, S. Fukushima, M. Yasuda, M. Seki, J. Am. Chem. Soc. 2008, 130, 14044-14045.
29. S. Grilli, V. Vespini, P. Ferraro, Langmuir 2008, 24, 13262-13265.