Silicon oxide synthesized using an atmospheric pressure microplasma jet from a tetraethoxysilane and oxygen mixture

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3487-3491

  Ding, Yi ^a   Pan, Qingtao ^a   Jin, Jie ^a   Jia, Haijun ^b   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Atmospheric pressure microplasma jet; Silicon dioxide; TEOS

Indexed keywords

DIELECTRIC CONSTANTS; DIELECTRIC LAYER; FIELD-EFFECT MOBILITIES; HIGH FIELD; HIGH FREQUENCY HF; INDUCTIVE COUPLINGS; LOCAL DEPOSITION; LOW-LEAKAGE CURRENT; MICRO-PLASMA JET; ON/OFF CURRENT RATIO; OXYGEN MIXTURES; SILICON DIOXIDE; TEOS; TETRAETHOXYSILANES; THERMAL SILICON; ZNO;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; DIELECTRIC MATERIALS; METAMATERIALS; OXYGEN; PLASMA DISPLAY DEVICES; SILICA; SYNTHESIS (CHEMICAL); THIN FILM TRANSISTORS; THRESHOLD VOLTAGE; ZINC OXIDE;

SILICON OXIDES;

EID: 77949489541     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.031     Document Type: Article

References (10)

1. Benedikt J., Focke K., Yanguas-Gil A., and von Keudell A. Appl. Phys. Lett. 89 (2006) 251504
2. Tan H.M.L., Fukuda H., Akagi T., and Ichiki T. Thin Solid Films 515 (2007) 5172
3. Ichiki T., Taura R., and Horiike Y. J. Appl. Phys. 95 (2004) 35
4. Raballand V., Benedikt J., and von Keudell A. Appl. Phys. Lett. 92 (2008) 091502
5. Ding Y., and Shirai H. J. Appl. Phys. 105 (2009) 043515
6. Cui H., Carter R.J., Moore D.L., Peng H., Gidley D.W., and Burke P.A. J. Appl. Phys. 97 (2005) 113302
7. Grill A., and Neumayer D.A. J. Appl. Phys. 94 (2003) 6697
8. Nishikawa H., Shiroyama T., Nakamura R., Ohki Y., Nagasawa K., and Hama Y. Phys. Rev. B45 (1992) 586
9. Noe P., Guignard J., Gentile P., Delamadeleine E., Calvo V., Ferret P., Dhalluin F., and Baron T. J. Appl. Phys. 102 (2007) 0160103
10. Liao S., Bao X.M., Zheng X.Q., Li N.S., and Min N.B. Appl. Phys. Lett. 68 (1996) 850