Effects of VUV/UV radiation and oxygen radicals on low-temperature sterilization in surface-wave excited O2 plasma

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3590-3594

  Zhao, Ying ^a   Singh, Mrityunjai K ^a   Ogino, Akihisa ^a   Nagatsu, Masaaki ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Oxygen plasma; Radicals; Sterilization; VUV UV

Indexed keywords

EMISSION SPECTRUMS; ETCHING EFFECT; GAS PRESSURES; GEOBACILLUS STEAROTHERMOPHILUS; GLASS FILTERS; INACTIVATION PROCESS; LOW TEMPERATURES; OXYGEN GAS; OXYGEN PLASMAS; OXYGEN RADICAL; PLASMA CHAMBERS; PLASMA TREATMENT; SEM ANALYSIS; SURVIVAL CURVES; VACUUM CONDITION; VUV EMISSION;

EMISSION SPECTROSCOPY; GLASS; ORGANIC POLYMERS; OXYGEN; PLASMA APPLICATIONS; PLASMAS; RADIATION EFFECTS; STERILIZATION (CLEANING); VACUUM;

LEAKAGE (FLUID);

EID: 77949429639     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.056     Document Type: Article

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