Microwave plasmas for low-temperature dry sterilization

Biomaterials

Volumn 17, Issue 13, 1996, Pages 1273-1277

  Chau, The Tu ^a   Kao, Kwan Chi ^a   Blank, Gregory ^a   Madrid, Francisco ^a  

^a UNIVERSITY OF MANITOBA   (Canada)

Author keywords

Bacteria; Dry sterilization; Microwave plasmas

Indexed keywords

BACTERIA; BIOMEDICAL EQUIPMENT; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; REACTION KINETICS; SURFACES;

LOW TEMPERATURE DRY STERILIZATION; MICROWAVE PLASMAS;

STERILIZATION (CLEANING);

ARTICLE; BACTERIAL CELL WALL; CHEMICAL REACTION; INSTRUMENT STERILIZATION; MICROWAVE IRRADIATION; PRIORITY JOURNAL; TIME; VIRUS CAPSID;

EID: 0030199582     PISSN: 01429612     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0142-9612(96)80003-2     Document Type: Article

References (25)

1. Edward AI. Fundamentals of Microbiology. UK: Benjamin/Cumming, 1991; 709.
2. Mathews IP, Gibson C, Samuel AH. Sterilization of implantable devices. Clin Mater 1994; 15: 191.
3. Gould GW. Mechanism of resistance and dormancy. In: Hurst A, Gould GW, eds. The Bacterial Spore, Vol. 2. New York: Academic Press, 1983: 171-209.
4. Brewer JH. Aerospace research: application to industrial sterilization. In: Phillips GB, Miller WS, eds. Industrial Sterilization, 2nd edn. Durham, NC: Duke University Press, 1973: 299-303.
5. Chapio A. Radiation Chemistry of Polymeric Systems. New York: Interscience, 1962.
6. Ishigaki I, Yoshii F. Radiation effects on polymer materials in radiation sterilization of medical supplies. Radiat. Phys. Chem 1992; 39: 527-533.
7. Bruch CW. Factors determining choice of sterilization procedure. In: Phillips GB, Miller WS, eds. Industrial Sterilization, 2nd edn. Durham, NC: Duke University Press, 1973: 119-123.
8. Ernst RR. Ethylene oxide gaseous sterilization for industrial applications. In: Phillips GB, Miller WS, eds. Industrial Sterilization, 2nd edn. Durham, NC: Duke University Press, 1973: 181-207.
9. Hogstedt C, Berndtsson BS, Rohlen O, Ehrenberg L. A cohort study on mortality and cancer incidence among employees exposed to chemicals in the production of ethylene oxide. Br J Ind Med 1979; 36: 276-279.
10. Generoso WM, Cumming RB, Bandy JA, Cain KT. Increased dominant lethal effects due to prolonged exposure of mice to inhaled ethylene oxide. Mutat Res 1983; 199: 377-380.
11. Yager JW, Hines VCJ, Spear RC. Exposure to ethylene oxide at work increases sister chromatid exchanges in peripheral lymphocytes. Science 1983; 219: 1231-1233.
12. Stanley P, Bertranou E, Forest F, Langewin L. Toxicity of ethylene oxide sterilization of polyvinyl chloride in open-heart surgery. J Thorac Cardiovasc Surg 1971; 61: 309-312.
13. Jacob A. US Patent 5171, 525, 1992.
14. Campbell BA. US Patent 5184, 046, 1993.
15. Chen K, Zhang E, Wu J, Zhen H, Guan Z, Zhou B. J Vac Sci Technol 1986; A(3): 828-831.
16. Okamoto Y, Tamagawa H. Production of large area high current ion beams. Rev Sci Instrum 1972; 43: 1193.
17. Sakudo N, Tokiguchi K, Hoike H, Kamomata I. Microwave ion source. Rev Sci Instrum 1977; 48: 762.
18. Majia SR, Chau TT, McLeod RD, Kao KC, Card HC. Electron cyclotron resonance microwave-plasma etching. Can J Phys 1987; 65: 856.
19. Chau TT, Mejia SR, Kao KC. New approach to low temperture deposition of high-quality thin films by new electron cyclotron resonance. J Vac Sci Technol 1992; B10: 2170.
20. 2 plasma in a reactive ion beam etching system. Jpn J Appl Phys 1984; 23: L564.
21. Matsuo S, Kiuchi M. Low temperature chemical vapor deposition method utilizing an electron cyclotron resonance plasma. Jpn J Appl Phys 1983; 22: L210.
22. Ono T, Takahashi C, Matsuo S. Electron cyclotron resonance plasma deposition technique using raw material supply by sputtering. Jpn J Appl Phys 1984; 23: L534.
23. Cook JM, Benson BW. Application of EPR spectroscopy to oxidative removal of organic materials. J Electrochem Soc 1983; 130: 2459.
24. Mejia SR, McLeod RD, Kao KC, Card HC. Electron-cyclotron resonant microwave plasma system for thin film deposition. Rev Sci Instrum 1986; 67: 493-496.
25. Pearse RWB. The Identification of Molecular Spectra, 3rd edn. London: Chapman & Hall, 1963.