Competition between electrochemical advanced oxidation and electrochemical hypochlorination of sulfamethoxazole at a boron-doped diamond anode

Industrial and Engineering Chemistry Research

Volumn 49, Issue 6, 2010, Pages 2537-2542

  Boudreau, Jordache ^a   Bejan, Dorin ^a   Li, Shuhuan ^a   Bunce, Nigel J ^a  

^a UNIVERSITY OF GUELPH   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED OXIDATION; ADVANCED OXIDATION PROCESSES; BORON-DOPED DIAMOND ANODES; CHLORIDE IONS; CHLORINATED BYPRODUCTS; HYDROXYL RADICALS; HYPOCHLORINATION; MODEL SUBSTRATES; REACTION PATHWAYS; SODIUM HYPOCHLORITES; SULFAMETHOXAZOLE; WASTE STREAM;

BORON; CHLORINE COMPOUNDS; IONS; MINERALOGY;

ELECTROCHEMICAL OXIDATION;

EID: 77949387553     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie900614d     Document Type: Article

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