Chlorine evolution at highly boron-doped diamond electrodes

Journal of the Electrochemical Society

Volumn 147, Issue 7, 2000, Pages 2614-2619

  Ferro, S ^a   De Battisti, A ^a   Duo, I ^b   Comninellis, Ch ^b   Haenni, W ^c   Perret, A ^c  

^a UNIVERSITY OF FERRARA   (Italy)

^b EPFL   (Switzerland)

^c CSEM   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CHLORINE; CYCLIC VOLTAMMETRY; IONIC STRENGTH; OXIDATION; PH; SEMICONDUCTING BORON; SEMICONDUCTING DIAMONDS; SEMICONDUCTING FILMS; SEMICONDUCTOR DOPING; SURFACE TREATMENT; THIN FILMS;

TAFEL SLOPES;

ELECTROCHEMICAL ELECTRODES;

EID: 0034228455     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393578     Document Type: Article

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