Titanium buffer layer for improved field emission of CNT based cold cathode

Applied Surface Science

Volumn 256, Issue 11, 2010, Pages 3563-3566

  Srividya, S ^a   Gautam, S ^b   Jha, P ^b   Kumar, P ^b   Kumar, A ^b   Ojha, U S ^b   Rawat, J S B S ^b   Pal, S ^b   Chaudhary, P K ^b   Harsh, ^b   Sinha, R K ^a  

^a DELHI TECHNOLOGICAL UNIVERSITY   (India)

^b SOLID STATE PHYSICS LABORATORY   (India)

Author keywords

Carbon nanotube (CNT); Chemical vapor deposition (CVD); Field emission; Photolithography

Indexed keywords

ADHESION; BUFFER LAYERS; CHEMICAL VAPOR DEPOSITION; COLD CATHODE TUBES; CONTACT RESISTANCE; FIELD EMISSION; FIELD EMISSION CATHODES; FIELD EMISSION DISPLAYS; FLAT PANEL DISPLAYS; MICROELECTRONICS; PHOTOLITHOGRAPHY; YARN;

A-STABLE; CATALYST DEPOSITION; CHEMICAL VAPOR DEPOSITIONS (CVD); COLD CATHODES; EMISSION CURRENT DENSITY; VACUUM MICROELECTRONIC DEVICES;

CARBON NANOTUBES;

EID: 77649184829     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.12.155     Document Type: Article

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