Characterization of Zn1 - xMgxO transparent conducting thin films fabricated by multi-cathode RF-magnetron sputtering

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 2949-2952

  Maejima, K ^a   Shibata, H ^a   Tampo, H ^a   Matsubara, K ^a   Niki, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

RF magnetron sputtering; Transparent conducting oxide; Wide bandgap; ZnMgO; ZnO:Al (AZO); ZnO:Ga (GZO)

Indexed keywords

RF-MAGNETRON SPUTTERING; TRANSPARENT CONDUCTING OXIDE; WIDE BAND GAP; ZNMGO; ZNO;

ALUMINUM; ELECTRIC CONDUCTIVITY; ENERGY GAP; GALLIUM; MAGNETRON SPUTTERING; MAGNETRONS; PHASE SEPARATION; THIN FILMS; ZINC; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 77649115812     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.196     Document Type: Article

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