Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1344-1347

  Chang, Tien Li ^a   Luo, Shao Wei ^a,b   Yang, Han Ping ^a   Lee, Chi Hung ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Diffraction grating; Femtosecond laser; Micromachining; PDMS

Indexed keywords

BONDING TECHNIQUES; EMBEDDED DIFFRACTION GRATING; FEMTOSECOND LASER; FEMTOSECOND LASER MICROMACHINING; FEMTOSECONDS; FS-LASER; NEW PROCESS; OPTICAL PHASE SHIFTS; PDMS SUBSTRATE; POLYDIMETHYLSILOXANE PDMS; PULSE WIDTH; PULSED LASER; REPETITION RATE; SOFT-LITHOGRAPHY; VISIBLE LIGHT;

COMPOSITE MICROMECHANICS; CONCURRENT ENGINEERING; DIFFRACTION; DIFFRACTION GRATINGS; JOB ANALYSIS; LIGHT; MICROCHANNELS; MICROMACHINING; OPTICAL WAVEGUIDES; PULSE REPETITION RATE; PULSED LASERS; RAPID PROTOTYPING; SILICONES; ULTRASHORT PULSES;

PULSED LASER APPLICATIONS;

EID: 76949084899     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.12.037     Document Type: Article

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