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Volumn 10, Issue 2, 2010, Pages 393-397

Nanoscale structural engineering via phase segregation: Au-Ge system

Author keywords

Nanoscale diffusion; Nanowires; Phase segregation; Supercooling

Indexed keywords

CONCENTRATION OF; CORE/SHELL; ELECTRICAL MEASUREMENT; EUTECTIC TEMPERATURE; FORMATION MECHANISM; GE SYSTEMS; IN-SITU TRANSMISSION; LOW TEMPERATURES; NANO SCALE; NANODISKS; NANOSCALE DIFFUSION; PHASE SEGREGATIONS; SOLID SOLUBILITIES; STRUCTURAL ENGINEERING;

EID: 76749134389     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl902597m     Document Type: Article
Times cited : (24)

References (21)
  • 2
    • 49249128085 scopus 로고    scopus 로고
    • (b) Javey, A. ACS Nano 2008, 2, 1329.
    • (2008) ACS Nano , vol.2 , pp. 1329
    • Javey, A.1
  • 3
  • 4
    • 21144442707 scopus 로고    scopus 로고
    • (d) Yang, P. MRS Bull. 2005, 30, 85.
    • (2005) MRS Bull. , vol.30 , pp. 85
    • Yang, P.1
  • 17
    • 76749116383 scopus 로고    scopus 로고
    • 2 (30 seem) gases were used at a pressure of 250 mTorr and power of 250 W. To minimize resist heating, pulsed etching cycles consisting of 10 s of plasma being on and 30 s of plasma being off were used. The total etch time was 60 s (6 cycles)
    • 2 (30 seem) gases were used at a pressure of 250 mTorr and power of 250 W. To minimize resist heating, pulsed etching cycles consisting of 10 s of plasma being on and 30 s of plasma being off were used. The total etch time was 60 s (6 cycles).


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