Ar plasma treatment on few layer graphene sheets for enhancing their field emission properties

Journal of Physics D: Applied Physics

Volumn 43, Issue 5, 2010, Pages

  Qi, J L ^a   Wang, X ^a   Zheng, W T ^a   Tian, H W ^a   Hu, C Q ^a   Peng, Y S ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMA TREATMENT; EMISSION CURRENT DENSITY; FIELD EMISSION PROPERTY; GRAPHENE SHEETS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; PLASMA TREATMENT; SHARP EDGES; TURN-ON ELECTRIC FIELD;

ELECTRIC FIELDS; FIELD EMISSION; GRAPHENE; GRAPHITE; LEAKAGE (FLUID); PLASMA ETCHING; PLASMAS;

PLASMA DEPOSITION;

EID: 76649113750     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/5/055302     Document Type: Article

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