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Volumn 25, Issue 3, 2010, Pages
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Dependence of melting, roughness and contact resistances on Ge and Ni content in alloyed AuGe/Ni/Au-type electrical contacts to GaAs/AlGaAs multilayer structures
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEAL TEMPERATURES;
BARRIER HEIGHTS;
CURRENT CONDUCTION;
ELECTRICAL CONTACTS;
EUTECTIC ALLOYS;
FILM STRUCTURE;
GAAS/ALGAAS;
GE CONTENT;
LAYER THICKNESS;
LOW TEMPERATURES;
MAGNETIZATION DATA;
MELTING TEMPERATURES;
MULTILAYER STRUCTURES;
NI CONTENT;
TEMPERATURE DEPENDENCE;
DIFFERENTIAL SCANNING CALORIMETRY;
DISSOLUTION;
ELECTRIC CONTACTS;
GERMANIUM;
MELTING POINT;
METAL MELTING;
MULTILAYERS;
NANOCRYSTALLINE ALLOYS;
STRUCTURAL OPTIMIZATION;
CONTACT RESISTANCE;
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EID: 76649097363
PISSN: 02681242
EISSN: 13616641
Source Type: Journal
DOI: 10.1088/0268-1242/25/3/035002 Document Type: Article |
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Times cited : (5)
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References (20)
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