MTMO grayscale photomask

Optics Express

Volumn 18, Issue 3, 2010, Pages 2621-2631

  Guo, Chuan Fei ^a,b   Zhang, Jianming ^a,b   Miao, Junjie ^a,c   Fan, Yongtao ^d   Liu, Qian ^a  

^a NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c PEKING UNIVERSITY   (China)

^d SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIC COMPOUNDS; TIN;

GRAIN MODELS; GRAINLESS; GRAY SCALE; GRAYSCALE PHOTOMASKS; HIGH RESOLUTION; LASER DIRECT WRITING; METAL FILM; NANOMETER SIZE; OXIDATION MODEL; REFINEMENT METHODS; THREE-DIMENSIONAL MICROSTRUCTURES; WAVELENGTH RANGES;

PHOTOMASKS;

EID: 76149109133     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.002621     Document Type: Article

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