Electromechanical properties of ferroelectric films for MEMS

Ferroelectrics

Volumn 258, Issue 1, 2001, Pages 209-220

  Kholkin, Andrei ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

actuators; domains; ferroelectric thin films; piezoelectricity

Indexed keywords

AC ELECTRIC FIELD; BULK MATERIALS; DOMAIN WALL MOTION; DOMAINS; ELECTROMECHANICAL PROPERTY; ELECTROMECHANICAL RESPONSE; ELECTROSTRICTION COEFFICIENT; LARGE ANISOTROPY; MICRO DEVICES; MICROELECTROMECHANICAL SYSTEMS; MORPHOTROPIC PHASE BOUNDARIES; PIEZOELECTRIC PROPERTY; PIEZOELECTRICS; PREFERRED ORIENTATIONS; PZT FILM; RELAXOR SINGLE CRYSTALS; RHOMBOHEDRAL COMPOSITION; RIGID SUBSTRATES; SI TECHNOLOGY; SMALL GRAIN SIZE; THIN FILM FERROELECTRICS; THIN LAYERS;

ACTUATORS; ANISOTROPY; COMPOSITE MICROMECHANICS; CRYSTALLOGRAPHY; ELECTRIC FIELDS; FERROELECTRIC DEVICES; FERROELECTRIC MATERIALS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; FILMS; MATERIALS HANDLING EQUIPMENT; MATERIALS PROPERTIES; MEMS; MICROELECTROMECHANICAL DEVICES; PIEZOELECTRIC DEVICES; PIEZOELECTRICITY; SINGLE CRYSTALS; VAPOR DEPOSITION;

FERROELECTRIC FILMS;

EID: 75949094031     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150190108008674     Document Type: Conference Paper

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