Porous photoresist stamps for selective plasma treatment

Plasma Processes and Polymers

Volumn 7, Issue 1, 2010, Pages 9-15

  Stöhr, Uwe ^a   Dohse, Antje ^b   Hoppe, Paul ^a   Gehringer, Andreas ^a   Thomas, Michael ^b   Klages, Claus Peter ^b   Reinecke, Holger ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Area selective surface treatment; Dielectric barrier discharge; Monomers; Photoresist; Plasma printing; Plasma coating

Indexed keywords

AREA-SELECTIVE SURFACE TREATMENT; DIELECTRIC BARRIER DISCHARGE; DIELECTRIC BARRIER DISCHARGES; SELECTIVE SURFACE;

ATMOSPHERIC PRESSURE; COATINGS; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; FLOW CONTROL; MONOMERS; PHOTORESISTORS; PHOTORESISTS; PLASMA APPLICATIONS; PLATE METAL; PLATING; POROUS MATERIALS; POROUS PLATES; PRINTING; SINTERING; SUBSTRATES; SURFACE TREATMENT;

PLASMAS;

EID: 75649093766     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900063     Document Type: Article

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