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Volumn 53, Issue 1, 2004, Pages 29-34

Effect of heat treatment on TiN films deposited by CFUBMS

Author keywords

CFUBMS; Heat treatment; TiN

Indexed keywords

ARGON; COLOR; COMPOSITION; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; HEAT TREATMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE;

EID: 7544251817     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2004.07.011     Document Type: Article
Times cited : (13)

References (11)
  • 2
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    • Molarius JM, Korhonen AS, Harju E, Lappalainen R. Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings. Surf Coat Technol 1987;33:117-32.
    • (1987) Surf Coat Technol , vol.33 , pp. 117-132
    • Molarius, J.M.1    Korhonen, A.S.2    Harju, E.3    Lappalainen, R.4
  • 3
    • 0027558511 scopus 로고
    • Mechanical properties of heat treated and worn PVD TiN, (Ti, Al)N, (Ti, Nb)N and Ti (C, N) coatings as measured by nanoindentation
    • Vancoille E, Celis JP, Roos JR. Mechanical properties of heat treated and worn PVD TiN, (Ti, Al)N, (Ti, Nb)N and Ti (C, N) coatings as measured by nanoindentation. Thin Solid Films 1993;224:168-76.
    • (1993) Thin Solid Films , vol.224 , pp. 168-176
    • Vancoille, E.1    Celis, J.P.2    Roos, J.R.3
  • 5
    • 0342538895 scopus 로고    scopus 로고
    • The degradation of TiN films on Cu substrates at high temperature under controlled atmosphere
    • Lu Fu-Hsing, Feng Shiaw-Pyng, Chen Hong-Ying, Li Ji-Kwei. The degradation of TiN films on Cu substrates at high temperature under controlled atmosphere. Thin Solid Films 2000;375:123-7.
    • (2000) Thin Solid Films , vol.375 , pp. 123-127
    • Lu, F.-H.1    Feng, S.-P.2    Chen, H.-Y.3    Li, J.-K.4
  • 6
    • 0036672187 scopus 로고    scopus 로고
    • Variation of color in titaniým and zirconium nitride decorative thin films
    • Niyomsoan S, Grant W, Olson DL, Mishra B. Variation of color in titaniým and zirconium nitride decorative thin films. Thin Solid Films 2002;415:187-94.
    • (2002) Thin Solid Films , vol.415 , pp. 187-194
    • Niyomsoan, S.1    Grant, W.2    Olson, D.L.3    Mishra, B.4
  • 7
    • 0024051440 scopus 로고
    • Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour deposition
    • Sanders FHM, Verspui G. Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour deposition. Thin Solid Films 1988;161:L87.
    • (1988) Thin Solid Films , vol.161
    • Sanders, F.H.M.1    Verspui, G.2
  • 9
    • 0035897250 scopus 로고    scopus 로고
    • Annealing studies of TiN films deposited plasma-assisted CVD
    • Cheng Z, Peng H, Joe G, Shi Y. Annealing studies of TiN films deposited plasma-assisted CVD. Surf Coat Technol 2001;138:237-41.
    • (2001) Surf Coat Technol , vol.138 , pp. 237-241
    • Cheng, Z.1    Peng, H.2    Joe, G.3    Shi, Y.4
  • 10
    • 0023120403 scopus 로고
    • Tempering efiecb in ion-plated TiN films: Texture, residual stress, adhesion and colour
    • Perry AJ. Tempering efiecb in ion-plated TiN films: texture, residual stress, adhesion and colour. Thin Solid Films 1987;146:165-74.
    • (1987) Thin Solid Films , vol.146 , pp. 165-174
    • Perry, A.J.1
  • 11
    • 0030218504 scopus 로고    scopus 로고
    • Residual stress and its thermal relaxation in TiN films
    • Matsue T, Hanabusa T, Ikeuchi Y. Residual stress and its thermal relaxation in TiN films. Thin Solid Films 1996; 281-282:344-7.
    • (1996) Thin Solid Films , vol.281-282 , pp. 344-347
    • Matsue, T.1    Hanabusa, T.2    Ikeuchi, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.