Analysis of plasma dynamics of a negative ion source based on probe measurements

Journal of Applied Physics

Volumn 96, Issue 8, 2004, Pages 4107-4113

  Bandyopadhyay, M ^a,b   Tanga, A ^a   Falter, H D ^a   Franzen, P ^a   Heinemann, B ^a   Holtum, D ^a   Kraus, W ^a   Lackner, K ^a   McNeely, P ^a   Riedl, R ^a   Speth, E ^a   Wilhelm, R ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b INSTITUTE FOR PLASMA RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL FLOW; DIFFERENTIAL EQUATIONS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; HYDROGEN; ION SOURCES; MAGNETIC FILTERS; PARAMETER ESTIMATION; PLASMA DENSITY; SATURATION (MATERIALS COMPOSITION);

ELECTRON CURRENTS; ELECTRON PRESSURE GRADIENT; GRID BIASING; RADIO FREQUENCY;

PLASMA FLOW;

EID: 7544228153     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1787619     Document Type: Article

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