Effect of applied bias voltage on corrosion-resistance for TiC 1-x N x and Ti 1-x Nb x C 1-y N y coatings

Applied Surface Science

Volumn 256, Issue 9, 2010, Pages 2876-2883

  Caicedo, J C ^a,c   Amaya, C ^a,b   Yate, L ^c   Aperador, W ^a   Zambrano, G ^a   Gomez M E ^a   Alvarado Rivera, J ^d   Munoz Saldana J ^d   Prieto, P ^a,e  

^a UNIVERSIDAD DEL VALLE   (Colombia)

^b Laboratorio de Recubrimientos Duros   (Colombia)

^c UNIVERSITY OF BARCELONA   (Spain)

^d DEPARTAMENTO DE FÍSICA   (Mexico)

^e Centro de Excelencia en Nuevos Materiales CENM   (Colombia)

Author keywords

Electrochemical properties; Raman spectra; X ray scattering

Indexed keywords

BIAS VOLTAGE; CARBON NITRIDE; CORROSION RESISTANCE; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL PROPERTIES; HARDENING; NIOBIUM COMPOUNDS; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SODIUM CHLORIDE; SPECTROSCOPIC ANALYSIS; STEEL CORROSION; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

APPLIED BIAS VOLTAGE; IMPEDANCE SPECTROSCOPY; QUATERNARY COMPOUND; R.F. MAGNETRON SPUTTERING; RAMAN INTENSITIES; RESONANCE ENHANCEMENT; SURFACE CORROSION; TAFEL POLARIZATION CURVES;

CORROSION RESISTANT COATINGS;

EID: 75249102774     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.11.042     Document Type: Article

References (26)

1. Hirsch T., and Mayr P. Surf. Coat. Technol. 36 (1988) 729-741
2. Rickerby D.S., and Burnett P.J. Thin Solid Films 157 (1988) 195-199
3. Bergmann E., Kaufmann H., Vogel I., and Schmid R. Surf. Coat. Technol. 42 (1990) 237-241
4. Tobioka M. Proceedings of the 12th International Plansee Seminar. Austria (1989) 221-225
5. Rie K.T., Gebauer A., Wiihle J., Ttinshoff H.K., and Blawit C. Surf. Coat. Technol. 75 (1995) 375-379
6. Shtansky D.V. Testing and application. In: NATO Series (Ed). Nanostructured Thin flims and Nanodispersion Strengthened Coatings (2004), A.A. Acad. Publ. 155-166
7. Senna L.F., Achete C.A., Freire F.L., and Hirsch T. Surf. Coat. Technol. 95 (1997) 390-397
8. de Sánchez N.A., Jaramillo H.E., Vivas Z., Aperador W., Amaya C., and Caicedo J.C. Adv. Mater. Res. 38 (2008) 63-75
9. Correa F., Caicedo J.C., Aperador W., Rincón C., and Bejarano G. Rev. Fac. Ing. Univ. Antioq. 46 (2008) 7-14
10. Surviliene S., Bellozor S., Kurtinaitiene M., and Safonov V.A. Surf. Coat. Technol. 176 (2004) 193-201
11. Choquette Y., Brossard L., Laeia A., and Menard H. J. Electrochem. Soc. 137 6 (1990) 1723-1727
12. Cordova J.M., Sayagues M.J., Alcala M.D., and Gotor F.J. J. Mater. Chem 17 (2007) 650-657
13. Schneider J.M., Voevodin A., Reblmlz C., Matthews A., Hogg J.H.C., Lewis D.B., and Ives M. Surf. Coat. Technol. 75 (1995) 312-319
14. Levi G., Kaplan W.D., and Bamberger M. Mater. Lett. 35 (1998) 344-350
15. Spengler W., Kaiser R., Christensen A.N., and Müller-Vogt G. Phys. Rev. B: Condens. Mat. Mater. Phys. 17 (1978) 1095-1100
16. Harley R.T., Page J.B., and Walker C.T. Phys. Rev. B: Condens. Mat. Mater. Phys. 3 (1971) 1365
17. Kawate M., Kimura A., and Suzuki T. J. Vac. Sci. Technol. A: Vac. Surf. Coat. 20 (2002) 569-575
18. Montgomery Jr. G.P., Klein M.V., Ganguly B.N., and Wood R.F. Condens. Mat. Mater. Phys. 6 (1972) 4047-4052
19. Gall D., Stoehr M., and Greene J.E. Phys. Rev. B: Condens. Mat. Mater. Phys. 64 (2001) 174302
20. Constable C.P., Yarwood J., and Münz W.-D. Surf. Coat. Technol. 119 (1999) 155-159
21. Lugscheider E., Bobzin K., and Lackner K. Surf. Coat. Technol. 175 (2003) 681-684
22. Talyzin A., Hogberg H., and Jansson U. Thin Solid Films 405 (2002) 42-49
23. Randles J.E.B. Discuss. Faraday Soc. 1 (1947) 11-18
24. Ahn S.H., Yoo J.H., Choi Y.S., Kim J.G., and Han J.G. Surf. Coat. Technol. 162 (2003) 212-221
25. Feng H.-P., Hsu C.-H., Lu J.-K., and Shy Y.-H. Mater. Sci. Eng. A 347 (2003) 123-129
26. Alonso-Falleiros N., and Wolynec S. Mater. Res. 1 (1998) 39-458