Solar-blind deep-UV band-pass filter (250-350 nm) consisting of a metal nano-grid fabricated by nanoimprint lithography

Optics Express

Volumn 18, Issue 2, 2010, Pages 931-937

  Li, Wen Di ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; FABRICATION; LIGHT TRANSMISSION; NANOIMPRINT LITHOGRAPHY; OPTOELECTRONIC DEVICES; SILICON COMPOUNDS;

DEEP-UV; INTEGRATED IMAGING; LOW COSTS; OPTICAL PERFORMANCE; PASS BANDS; REJECTION RATIOS; RIGOROUS COUPLED WAVE ANALYSIS; SOLAR-BLIND; SQUARE GRID; TRANSMISSION PEAKS; VISIBLE WAVELENGTHS;

BANDPASS FILTERS;

ALUMINUM; NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; FILTRATION; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; OPTICAL INSTRUMENTATION; PHOTOGRAPHY; REFRACTOMETRY; SOLAR ENERGY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION;

ALUMINUM; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; FILTRATION; NANOSTRUCTURES; NANOTECHNOLOGY; OPTICAL DEVICES; PHOTOGRAPHY; REFRACTOMETRY; SILICON DIOXIDE; SOLAR ENERGY; ULTRAVIOLET RAYS;

EID: 75249090178     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.000931     Document Type: Article

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