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Volumn 48, Issue 12, 2009, Pages

Preparation of atomically flat TiO2(110) substrate

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIONAL HEATING; CHEMICAL ETCHING; RUTILE TIO; SIMPLE APPROACH; STRUCTURAL CHANGE; TEMPERATURE DEPENDENCE; THERMAL-ANNEALING; TIO;

ELECTRON DIFFRACTION; HEATING; OXIDE MINERALS; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; VACUUM;

AUGER ELECTRON SPECTROSCOPY;

EID: 75149168775 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.125506 Document Type: Article

Times cited : (6)

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