Electrical properties of Ta-doped SnO2 thin films epitaxially grown on TiO2 substrate

Applied Physics Letters

Volumn 93, Issue 13, 2008, Pages

  Toyosaki, H ^a   Kawasaki, M ^b,c   Tokura, Y ^a,b,d  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b RIKEN   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES;

ELECTRICAL PROPERTIES;

TANTALUM;

EID: 53349128006     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2993346     Document Type: Article

References (19)

1. T. Minami, Semicond. Sci. Technol. 0268-1242 10.1088/0268-1242/20/4/004 20, S35 (2005).
2. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. 0003-6951 10.1063/1.1949728 86, 252101 (2005).
3. H. Ohta, M. Orita, M. Hirano, H. Tanji, H. Kawazoe, and H. Hosono, Appl. Phys. Lett. 0003-6951 10.1063/1.126461 76, 2740 (2000).
4. T. Koida and M. Kondo, J. Appl. Phys. 0021-8979 10.1063/1.2712161 101, 063713 (2007).
5. T. Makino, Y. Segawa, A. Tsukazaki, A. Ohtomo, and M. Kawasaki, Appl. Phys. Lett. 0003-6951 10.1063/1.1991994 87, 022101 (2005).
6. R. D. Shannon, Acta Crystallogr., Sect. A: Cryst. Phys., Diffr., Theor. Gen. Crystallogr. 0567-7394 10.1107/S0567739476001551 32, 751 (1976).
7. Y. -W. Kim, S. W. Lee, and H. Chen, Thin Solid Films 0040-6090 10.1016/S0040-6090(01)01635-2 405, 256 (2002).
8. Y. Yamamoto, K. Nakajima, T. Ohsawa, Y. Matsumoto, and H. Koinuma, Jpn. J. Appl. Phys., Part 2 0021-4922 10.1143/JJAP.44.L511 44, L511 (2005).
9. A. Tsukazaki, H. Saito, K. Tamura, M. Ohtani, H. Koinuma, M. Sumiya, S. Fuke, T. Fukumura, and M. Kawasaki, Appl. Phys. Lett. 0003-6951 10.1063/1.1491294 81, 235 (2002).
10. M. Sumiya, S. Fuke, A. Tsukazaki, K. Tamura, A. Ohtomo, M. Kawasaki, and H. Koinuma, J. Appl. Phys. 0021-8979 10.1063/1.1542938 93, 2562 (2003).
11. R. L. Weiher, J. Appl. Phys. 0021-8979 10.1063/1.1702560 33, 2834 (1962).
12. M. Okude, K. Ueno, H. Itoh, M. Kikuchi, A. Ohtomo, and M. Kawasaki, J. Phys. D 0022-3727 10.1088/0022-3727/41/12/125309 41, 125309 (2008).
13. C. G. Fonstad and R. H. Rediker, J. Appl. Phys. 0021-8979 10.1063/1.1660648 42, 2911 (1971).
14. L. Forro, O. Chauvet, D. Emin, L. Zuppiroli, H. Berger, and F. Lěvy, J. Appl. Phys. 0021-8979 10.1063/1.355801 75, 633 (1994).
15. D. C. Look, D. C. Reynolds, J. R. Sizelove, R. L. Jones, C. W. Litton, G. Cantwell, and W. C. Harsch, Solid State Commun. 0038-1098 10.1016/S0038- 1098(97)10145-4 105, 399 (1998).
16. H. Kim, J. S. Horwitz, S. B. Qadri, and D. B. Chrisey, Thin Solid Films 420, 107 (2002).
17. A. Tsukazaki, A. Ohtomo, T. Kita, Y. Ohno, H. Ohno, and M. Kawasaki, Science 0036-8075 10.1126/science.1137430 315, 1388 (2007).
18. I. Hamberg and C. G. Granqvist, J. Appl. Phys. 0021-8979 10.1063/1.337534 60, R123 (1986).
19. K. Ellmer and R. Mientus, Thin Solid Films 0040-6090 10.1016/j.tsf.2007. 05.084 516, 4620 (2008).