Influence of laser wavelength and pulse duration on processing of crystalline silicon

ICALEO 2008 - 27th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings

Volumn , Issue , 2008, Pages 254-263

  Haupt, Oliver ^a   Schoonderbeek, Aart ^a   Richter, Lars ^a   Kling, Rainer ^a   Ostendorf, Andreas ^a  

^a LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRONICS INDUSTRY; ENERGY GAP; SILICON WAFERS;

CRYSTALLINE SILICONS; INDIRECT BAND GAP; MATERIAL REMOVAL PROCESS; OPTICAL BEHAVIOUR; PHOTOVOLTAIC APPLICATIONS; PICO-SECOND PULSE; RADIATION WAVELENGTH; RISING TEMPERATURES;

LASER MATERIALS PROCESSING;

EID: 75149133676     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.2351/1.5061384     Document Type: Conference Paper

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