Effects of growth parameters on surface-morphological, structural and electrical properties of Mo films by RF magnetron sputtering

Materials Research Society Symposium Proceedings

Volumn 1123, Issue , 2009, Pages 67-72

  Kuo, Shou Yi ^a   Chang, Liann Be ^a   Jeng, Ming Jer ^a   Lin, Wei Ting ^a   Lu, Yong Tian ^b   Hu, Sung Cheng ^b  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b Chemical Systems Research Division   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON FLOW RATE; ATOMIC FORCE MICROSCOPES; DIFFUSION PROPERTIES; ELECTRICAL PROPERTY; FOUR-POINT PROBE; GROWTH PARAMETERS; OPTIMAL THICKNESS; PHOTOVOLTAIC DEVICES; RF-MAGNETRON SPUTTERING; RF-POWER; SEM; SODA LIME GLASS; SODA LIME GLASS SUBSTRATE; STEP SURFACE; STRUCTURAL AND ELECTRICAL PROPERTIES; WORKING PRESSURES;

ARGON; ELECTRIC RESISTANCE; FILM GROWTH; GLASS; INDUSTRIAL RESEARCH; LIME; MAGNETIC FILMS; MAGNETRON SPUTTERING; MAGNETRONS; MOLYBDENUM; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; SURFACES; X RAY DIFFRACTION;

ELECTRIC PROPERTIES;

EID: 74549127569     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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